⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3162735 | 0.85 | — | — | |
| SCHEMBL1412725 | 0.85 | — | — | |
| SCHEMBL9301166 | 0.84 | — | — | |
| SCHEMBL891760 | 0.80 | — | — | |
| SCHEMBL2606274 | 0.79 | TSHR (0.50) | — | |
| SCHEMBL8141462 | 0.79 | — | — | |
| SCHEMBL6895322 | 0.79 | — | — | |
| SCHEMBL1743646 | 0.77 | — | — | |
| SCHEMBL15494299 | 0.75 | TSHR (0.50) | — | |
| SCHEMBL18675771 | 0.75 | TSHR (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1454 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4182375-B1 | RELEASABLE COMPOSITIONS BASED ON POLYACETALS | DELO INDUSTRIE KLEBSTOFFE GMBH & CO KGAA (DE) | 2026-05-20 | — | — | EP | claimed |
| US-12565560-B2 | Releasable compositions based on polyacetals | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2026-03-03 | — | — | US | claimed |
| WO-2024191208-A1 | COMPOSITION FOR ENCAPSULATING ORGANIC LIGHT-EMITTING DIODES AND ORGANIC LIGHT-EMITTING DIODES DISPLAY COMPRISING ORGANIC LAYER PREPARED USING SAME | 삼성에스디아이주식회사 | 2024-09-19 | — | — | WO | claimed |
| US-20240254278-A1 | RELEASABLE COMPOSITIONS BASED ON POLYACETALS | DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) | 2024-08-01 | — | — | US | claimed |
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| EP-4321561-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG Chem, Ltd. (KR) | 2024-02-14 | — | — | EP | claimed |
| CN-117321120-A | Method for producing superabsorbent polymer and superabsorbent polymer | 株式会社LG化学 | 2023-12-29 | — | — | CN | claimed |
| US-20230365723-A1 | METHOD FOR PREPARING FINE PARTICLES HAVING ENCLOSED VOIDS WITH IMPROVED STAIN RESISTANCE CONTAINING FUNCTIONAL PHOSPHORIC ACID MONOMER AND COMPOSITION COMPRISING THE PARTICLES | HANKUCK LATICES CO., LTD. (KR) | 2023-11-16 | — | — | US | claimed |
| EP-4276117-A1 | METHOD FOR PREPARING FINE PARTICLES HAVING ENCLOSED VOIDS WITH IMPROVED STAIN RESISTANCE CONTAINING FUNCTIONAL PHOSPHORIC ACID MONOMER AND COMPOSITION COMPRISING THE PARTICLES | Hankuck Latices Co., Ltd. (KR) | 2023-11-15 | — | — | EP | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| CN-107200806-B | Acrylates grouting material and its application method | 青岛科技大学 | 2019-04-23 | — | — | CN | claimed |
| US-10030080-B2 | Method for preparing fine particles with enclosed voids and composition including fine particles | Hankuck Latices Corporation (KR) | 2018-07-24 | — | — | US | claimed |
| US-20170283643-A1 | METHOD FOR PREPARING FINE PARTICLES WITH ENCLOSED VOIDS AND COMPOSITION INCLUDING FINE PARTICLES | Hankuck Latices Corporation (KR) | 2017-10-05 | — | — | US | claimed |
| CN-107200806-A | Acrylates grouting material and its application method | 青岛科技大学 | 2017-09-26 | — | — | CN | claimed |
| US-6548566-B1 | Curable resin comprising polyol, epoxy compound, and photoinitiator | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2003-04-15 | — | — | US | claimed |
| US-5494508-A | CONTAINING VOIDED LATEX PARTICLES WITH CROSSLINKED SHELLS FROM ETHYLENICALLY UNSATURATED MONOMERS; LIQUID MARKER FOR CHALKBOARDS OR BLACKBOARDS | ROHM AND HAAS COMPANY (US) | 1996-02-27 | — | — | US | claimed |
| EP-0672734-A1 | An erasable marking composition | ROHM AND HAAS COMPANY (US) | 1995-09-20 | — | — | EP | claimed |
| US-5447560-A | Useful on a standard blackboard or chalkboard, voided latex particles having a core and crosslinked shell | ROHN AND HAAS COMPANY (US) | 1995-09-05 | — | — | US | claimed |
| US-4319015-A | USED AS SEPARATORS IN ION EXCHANGE RESIN FILTERS | BAYER AKTIENGESELLSCHAFT (DE) | 1982-03-09 | — | — | US | claimed |
| US-4156678-A | HIGH QUALITY INDUSTRIAL PAINT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-05-29 | — | — | US | claimed |