SCHEMBL29318985

SCHEMBL29318985

CCC(C)(C)C(=O)Oc1ccc(C(=O)OC2(C)CCCC2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 10/20 0.47
ADORA3 P0DMS8 1/20 0.39
RARA P10276 3/20 0.37
RARB P10826 3/20 0.37
LMNA P02545 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CYP19A1 P11511 1/20 0.36
SLC6A2 P23975 1/20 0.35
SLC6A4 P31645 1/20 0.35
SLC6A3 Q01959 1/20 0.35
ESR1 P03372 2/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
ESR2 Q92731 1/20 0.35
CA14 Q9ULX7 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12021637 0.84 ELANE (0.44) ELANEADORA3SMN1; SMN2CYP19A1TSHR
SCHEMBL25468052 0.83 ELANE (0.43) ELANEADORA3LMNASMN1; SMN2TDP1
SCHEMBL12021716 0.83 ELANE (0.43) ELANEADORA3SMN1; SMN2CYP19A1SLC6A2
SCHEMBL25468053 0.82 ELANE (0.42) ELANEADORA3SMN1; SMN2TDP1NPSR1
SCHEMBL25468063 0.81 ELANE (0.41) ELANEADORA3RARARARBPRTN3
SCHEMBL25468066 0.81 ELANE (0.43) ELANEADORA3RARARARBTDP1
SCHEMBL1104189 0.79 CA12 (0.57) ELANELMNASMN1; SMN2TDP1NPSR1
SCHEMBL29319752 0.79 MAOB (0.40) ADORA3SMN1; SMN2TDP1NPSR1CYP19A1
SCHEMBL1104226 0.78 ELANE (0.56) ELANESMN1; SMN2TDP1CA12CA1
SCHEMBL25468065 0.77 ELANE (0.40) ELANELMNATDP1PRTN3MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed