Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.40 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4394179 | 1.00 | MEN1 (0.44) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL29319832 | 1.00 | MEN1 (0.44) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL22266319 | 0.97 | MEN1 (0.48) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL8851375 | 0.97 | MEN1 (0.46) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL2958834 | 0.97 | MEN1 (0.46) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL3422293 | 0.97 | MEN1 (0.46) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL536471 | 0.97 | MEN1 (0.46) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL7413042 | 0.95 | MEN1 (0.50) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL24505431 | 0.92 | TSHR (0.46) | MEN1KMT2ATHRBHTTMAPT | |
| SCHEMBL642382 | 0.92 | TSHR (0.46) | MEN1KMT2ATHRBHTTMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4400914-A2 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-17 | — | — | EP | disclosed |