SCHEMBL29323810

SCHEMBL29323810

C=C(C)C(=O)OC(CS(=O)(=O)c1ccc(O)cc1)CS(=O)(=O)c1ccc(O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.43
CA2 P00918 3/20 0.39
ENPP2 Q13822 1/20 0.37
ALDH1A1 P00352 3/20 0.36
POLB P06746 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
GAA P10253 2/20 0.35
PKM P14618 1/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 1/20 0.35
HTT P42858 1/20 0.35
MMP13 P45452 5/20 0.34
ELANE P08246 1/20 0.34
MMP2 P08253 1/20 0.34
MMP3 P08254 1/20 0.34
MMP7 P09237 1/20 0.34
MMP9 P14780 1/20 0.34
MMP8 P22894 1/20 0.34
MMP14 P50281 1/20 0.34
MMP1 P03956 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9555060 0.87 KMT2A (0.42) KMT2ACA2ENPP2ALDH1A1POLB
SCHEMBL29323814 0.87 KMT2A (0.41) KMT2AALDH1A1POLBSMN1; SMN2GAA
SCHEMBL9554957 0.77 KMT2A (0.39) KMT2ACA2ENPP2ALDH1A1POLB
SCHEMBL9555297 0.75 KMT2A (0.48) KMT2ACA2ENPP2ALDH1A1POLB
SCHEMBL4660230 0.74 ESR1 (0.42) CA2ALDH1A1LMNACA12CA1
SCHEMBL29323824 0.74 ESR1 (0.46) KMT2ACA2ALDH1A1SMN1; SMN2LMNA
SCHEMBL9555196 0.74 KMT2A (0.39) KMT2ACA2ALDH1A1POLBSMN1; SMN2
SCHEMBL9555062 0.72 HTT (0.47) KMT2ACA2ENPP2ALDH1A1POLB
SCHEMBL29323820 0.72 TSHR (0.39) ALDH1A1
SCHEMBL2726083 0.72 TSHR (0.39) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed