SCHEMBL2932874

SCHEMBL2932874

[Co+2].[O-]B([O-])Oc1cccc2ccc3cc4ccccc4cc3c12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.40
ERBB2 P04626 1/20 0.40
FYN P06241 1/20 0.40
MAOA P21397 1/20 0.40
ACHE P22303 1/20 0.40
AHR P35869 1/20 0.40
ALDH1A1 P00352 7/20 0.34
HSD17B10 Q99714 5/20 0.34
HPGD P15428 4/20 0.34
HIF1A Q16665 2/20 0.34
CYP1B1 Q16678 2/20 0.34
THRB P10828 1/20 0.34
NQO1 P15559 1/20 0.34
GAA P10253 3/20 0.33
KDM4E B2RXH2 2/20 0.33
RXRA P19793 1/20 0.33
PPARG P37231 1/20 0.33
PPARD Q03181 1/20 0.33
PPARA Q07869 1/20 0.33
TSHR P16473 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15750821 0.97 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
Hydrochloric Acid SCHEMBL18529900 0.94 CYP1A2 (0.38) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL50100 0.85 CYP1A2 (0.43) CYP1A2ERBB2FYNMAOAACHE
Ammonia Solution, Strong SCHEMBL8665916 0.83 CYP1A2 (0.42) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL19259375 0.82 CYP1A2 (0.41) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL911163 0.81 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL1314570 0.81 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
Hydrogen Sulfide SCHEMBL17372873 0.81 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
Ammonia Solution, Strong SCHEMBL1035827 0.81 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
Phosphine SCHEMBL3288817 0.81 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1497337-B1 ANIONIC AND LEWIS BASE PHOTOPOLYMERIZATION PROCESS AND ITS USE FOR MAKING OPTICAL ARTICLES UNIV GEORGIA (US) 2010-09-22 EP disclosed
US-7253213-B2 Anionic and Lewis base photopolymerization process and its use for making optical articles ESSILOR (FR) 2007-08-07 US disclosed
US-20050203200-A1 Anionic and Lewis base photopolymerization process and its use for making optical articles ESSILOR (FR) 2005-09-15 US disclosed
US-6911485-B1 Anionic and Lewis base photopolymerization process and its use for making optical articles THE UNIVERSITY OF GEORGIA RESEARCH FOUNDATION, INC. (US) 2005-06-28 US disclosed
EP-1497337-A1 ANIONIC AND LEWIS BASE PHOTOPOLYMERIZATION PROCESS AND ITS USE FOR MAKING OPTICAL ARTICLES University of Georgia Research Foundation, Inc. (US) 2005-01-19 EP disclosed
WO-2003089478-A1 ANIONIC AND LEWIS BASE PHOTOPOLYMERIZATION PROCESS AND ITS USE FOR MAKING OPTICAL ARTICLES UNIVERSITY OF GEORGIA RESEARCH FOUNDATION, INC. (US) 2003-10-30 WO disclosed