⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2576698 | 1.00 | — | — | |
| SCHEMBL30122843 | 0.71 | — | — | |
| SCHEMBL29598459 | 0.71 | — | — | |
| Ammonia Solution, Strong SCHEMBL29655551 | 0.71 | — | — | |
| SCHEMBL31034808 | 0.71 | — | — | |
| Water SCHEMBL30578024 | 0.71 | — | — | |
| Bromide SCHEMBL30133760 | 0.71 | — | — | |
| Fluoride Ion SCHEMBL30203362 | 0.71 | — | — | |
| SCHEMBL526381 | 0.71 | — | — | |
| SCHEMBL23462252 | 0.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1000 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3642923-B1 | CABLE FITTING FOR A HIGH VOLTAGE DIRECT CURRENT TRANSMISSION CABLE | SUSONITY Commercial GmbH (DE) | 2026-05-20 | — | — | EP | claimed |
| EP-4203071-B1 | STRAIN COMPENSATION VIA ION IMPLANTATION IN RELAXED BUFFER LAYER TO PREVENT WAFER BOW | INTEL CORP (US) | 2026-05-20 | — | — | EP | claimed |
| EP-4243086-B1 | DUAL WIDTH FINFET | ST MICROELECTRONICS INC (US) | 2026-05-13 | — | — | EP | claimed |
| EP-4435787-B1 | SELF-SELECTING MEMORY DEVICE HAVING POLARITY DEPENDENT THRESHOLD VOLTAGE SHIFT CHARACTERISTICS AND MEMORY APPARATUS INCLUDING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-06 | — | — | EP | claimed |
| EP-4439562-B1 | SELF-SELECTING MEMORY DEVICE HAVING POLARITY DEPENDENT THRESHOLD VOLTAGE SHIFT CHARACTERISTICS AND MEMORY APPARATUS INCLUDING THE SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-06 | — | — | EP | claimed |
| EP-4490335-B1 | IMPROVED PRODUCTION OF AN ENERGY-REFLECTING COMPOSITE | MICHIELS GROUP (BE) | 2026-05-06 | — | — | EP | claimed |
| WO-2026088100-A1 | DETECTION OF ARSENIC(III) | UNIVERSITY OF JOHANNESBURG (ZA) | 2026-04-30 | — | — | WO | claimed |
| EP-4100988-B1 | GAS ELECTRON MULTIPLIER BOARD PHOTOMULTIPLIER | REUTER STOKES LLC (US) | 2026-04-29 | — | — | EP | claimed |
| EP-2262741-B2 | FINING AGENTS FOR SILICATE GLASSES | CORNING INC (US) | 2026-04-29 | — | — | EP | claimed |
| EP-4727713-A1 | CASTING MOULD AND METHOD FOR CASTING AT LEAST ONE CAST PART, AND CAST PART | Fritz Winter Eisengiesserei GmbH & Co. KG (DE) | 2026-04-22 | — | — | EP | claimed |
| EP-3672721-B1 | USE OF COMPOSITES FOR EXTRACTION OF METAL OR CONTAMINATING CHEMICAL SPECIES | ECOLE POLYTECHNIQUE FED LAUSANNE EPFL (CH) | 2022-04-13 | — | — | EP | claimed |
| EP-3379338-B1 | IMAGE FORMING DEVICE AND LIGHT-EMITTING ELEMENT INCLUDED IN SAME | HEWLETT PACKARD DEVELOPMENT CO (US) | 2022-03-30 | — | — | EP | claimed |
| EP-3224213-B1 | DOPED SILICA-TITANIA GLASS HAVING LOW EXPANSIVITY AND METHODS OF MAKING THE SAME | CORNING INC (US) | 2022-03-23 | — | — | EP | claimed |
| EP-3306670-B1 | SEMICONDUCTOR DEVICE STRUCTURE WITH NON PLANAR SIDE WALL AND METHOD OF MANUFACTURING USING A DOPED DIELECTRIC | NXP USA INC (US) | 2022-03-23 | — | — | EP | claimed |
| EP-3836193-B1 | METHOD FOR MANUFACTURING A DOPED SEMICONDUCTOR LAYER | COMMISSARIAT ENERGIE ATOMIQUE (FR) | 2022-03-09 | — | — | EP | claimed |
| WO-2022043015-A1 | BASE ENAMEL COMPOSITION, BASE ENAMEL COAT, ARTICLES HAVING SUCH A BASE ENAMEL COAT, AND METHOD OF PRODUCING SAME | PFAUDLER GMBH (DE) | 2022-03-03 | — | — | WO | claimed |
| EP-3064601-B1 | METHOD AND DEVICE FOR PROCESSING FLUE DUST | AURUBIS AG (DE) | 2022-03-02 | — | — | EP | claimed |
| EP-3839105-B1 | GAS PHASE EPITAXY METHOD | AZUR SPACE SOLAR POWER GMBH (DE) | 2022-02-23 | — | — | EP | claimed |
| EP-3739620-B1 | A SILICON GERMANIUM-ON-INSULATOR STRUCTURE | GLOBALWAFERS CO LTD (TW) | 2022-02-16 | — | — | EP | claimed |
| EP-3697376-B1 | COMPOSITION | WATER JEL EUROPE LLP (GB) | 2022-01-26 | — | — | EP | claimed |