Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.50 |
| ▸ | POLM | Q9NP87 | 1/20 | 0.49 |
| ▸ | POLK | Q9UBT6 | 1/20 | 0.49 |
| ▸ | POLL | Q9UGP5 | 1/20 | 0.49 |
| ▸ | POLH | Q9Y253 | 1/20 | 0.49 |
| ▸ | CES2 | O00748 | 2/20 | 0.47 |
| ▸ | CES1 | P23141 | 2/20 | 0.47 |
| ▸ | DGKA | P23743 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | EP300 | Q09472 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | FAAH | O00519 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29371710 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL30003164 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL29370938 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL29372133 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL20398624 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL20398590 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL23271733 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL20398671 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL29360726 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL | |
| SCHEMBL20398588 | 1.00 | EPHX2 (0.51) | EPHX2KMT2AKDM4EMEN1RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025028353-A1 | NOVEL HETEROCYCLIC RING-CONTAINING MONOMER | エア・ウォーター・パフォーマンスケミカル株式会社 | 2025-02-06 | — | — | WO | disclosed |
| WO-2025028354-A1 | PHOTORADICALLY POLYMERIZABLE COMPOSITION CONTAINING VINYL SULFIDE COMPOUND HAVING HETEROCYCLIC RING | エア・ウォーター・パフォーマンスケミカル株式会社 | 2025-02-06 | — | — | WO | disclosed |
| WO-2025028355-A1 | HIGHLY REFRACTIVE RADICAL-POLYMERIZABLE COMPOSITION INCLUDING SULFIDE COMPOUND | エア・ウォーター・パフォーマンスケミカル株式会社 | 2025-02-06 | — | — | WO | disclosed |
| CN-111413849-B | Photosensitive composition, preparation method thereof, pattern forming method and application | 常州强力先端电子材料有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-109471330-B | Photosensitive composition and photopolymerization initiator used therein | 东京应化工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| CN-110891980-B | Radical polymerization control agent and radical polymerization control method | 川崎化成工业株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114114839-A | Photosensitive resin composition, patterning method and application of photosensitive resin composition | 常州强力先端电子材料有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-106970503-B | Photosensitive composition | 东京应化工业株式会社 | 2022-02-01 | — | — | CN | disclosed |