SCHEMBL29370975

SCHEMBL29370975

CCCCC(=O)Oc1c2ccccc2c(OC(=O)CCCC)c2cc(F)ccc12

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.49
KDM4E B2RXH2 1/20 0.49
MEN1 O00255 1/20 0.49
RECQL P46063 1/20 0.49
HPGD P15428 1/20 0.43
HTR7 P34969 1/20 0.42
CNR1 P21554 2/20 0.38
CNR2 P34972 2/20 0.38
ALDH1A1 P00352 1/20 0.38
HSD17B10 Q99714 1/20 0.38
POLM Q9NP87 1/20 0.37
POLK Q9UBT6 1/20 0.37
POLL Q9UGP5 1/20 0.37
POLH Q9Y253 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
PTGS2 P35354 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29368543 0.96 KDM4E (0.45) KMT2AKDM4EMEN1RECQLHPGD
SCHEMBL29372044 0.95 KDM4E (0.44) KMT2AKDM4EMEN1RECQLCNR1
SCHEMBL29369130 0.93 KDM4E (0.39) KMT2AKDM4EMEN1RECQLHPGD
SCHEMBL29368591 0.87 KDM4E (0.57) KMT2AKDM4EMEN1RECQLPOLM
SCHEMBL20398686 0.87 KDM4E (0.57) KMT2AKDM4EMEN1RECQLPOLM
SCHEMBL29372421 0.85 ELANE (0.40) KMT2AKDM4ERECQLALDH1A1SMN1; SMN2
SCHEMBL23271805 0.84 KDM4E (0.47) KMT2AKDM4EMEN1RECQLCNR1
SCHEMBL29370994 0.84 KDM4E (0.47) KMT2AKDM4EMEN1RECQLCNR1
SCHEMBL23271804 0.83 KDM4E (0.46) KMT2AKDM4EMEN1RECQLCNR2
SCHEMBL29372033 0.83 KDM4E (0.46) KMT2AKDM4EMEN1RECQLCNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed