⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19082582 | 0.67 | — | — | |
| SCHEMBL11814556 | 0.61 | — | — | |
| SCHEMBL4527457 | 0.61 | — | — | |
| SCHEMBL516402 | 0.61 | — | — | |
| SCHEMBL5487354 | 0.59 | — | — | |
| SCHEMBL22329002 | 0.59 | — | — | |
| SCHEMBL18672797 | 0.59 | — | — | |
| SCHEMBL21170360 | 0.59 | — | — | |
| SCHEMBL4585190 | 0.59 | — | — | |
| SCHEMBL5487352 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| EP-4705309-A1 | CHLOROSILYL-SUBSTITUTED SILACYCLOALKANES AND THEIR USE FOR FORMATION OF FILMS COMPRISING SILICON AND OXYGEN | Versum Materials US, LLC (US) | 2026-03-11 | — | — | EP | disclosed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | disclosed |
| US-20250146131-A1 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC | 2025-05-08 | — | — | US | disclosed |
| EP-4508254-A1 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | Versum Materials US, LLC (US) | 2025-02-19 | — | — | EP | disclosed |
| US-20240304438-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2024-09-12 | — | — | US | disclosed |
| US-20240093360-A1 | COMPOSITIONS AND METHODS USING SAME FOR FILMS COMPRISING SILICON AND BORON | VERSUM MAT US LLC (US) | 2024-03-21 | — | — | US | disclosed |
| EP-4284960-A1 | COMPOSITIONS AND METHODS USING SAME FOR FILMS COMPRISING SILICON AND BORON | Versum Materials US, LLC (US) | 2023-12-06 | — | — | EP | disclosed |
| US-20230377874-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC | 2023-11-23 | — | — | US | disclosed |
| WO-2023220650-A1 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2023-11-16 | — | — | WO | disclosed |
| EP-4253597-A2 | COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | Versum Materials US, LLC (US) | 2023-10-04 | — | — | EP | disclosed |
| US-11742200-B2 | Composition and methods using same for carbon doped silicon containing films | VERSUM MATERIALS US, LLC (US) | 2023-08-29 | — | — | US | disclosed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | disclosed |
| WO-2022187238-A1 | COMPOSITIONS AND METHODS USING SAME FOR FILMS COMPRISING SILICON AND BORON | VERSUM MATERIALS US, LLC (US) | 2022-09-09 | — | — | WO | disclosed |
| US-20220145453-A1 | Methods For Making Silicon Containing Films That Have High Carbon Content | VERSUM MATERIALS US, LLC (US) | 2022-05-12 | — | — | US | disclosed |
| US-20220037151-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2022-02-03 | — | — | US | disclosed |