SCHEMBL29412871

SCHEMBL29412871

CN(C)[Ti](N(C)C)(N(C)C)C1(C)C=CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29412890 0.74
SCHEMBL29412922 0.70
SCHEMBL31442704 0.65
SCHEMBL29412899 0.59
SCHEMBL29385602 0.54
SCHEMBL29831472 0.54
SCHEMBL2357367 0.54
SCHEMBL16160994 0.54
SCHEMBL6666128 0.54
SCHEMBL24243502 0.51

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119613462-A Synthesis method of high-purity metal complex precursor 安徽亚格盛电子新材料股份有限公司 2025-03-14 CN claimed
CN-118496107-B Organic small molecule inhibitor and application method thereof in thin film deposition 合肥安德科铭半导体科技有限公司 2024-10-29 CN disclosed
CN-118496107-A Organic small molecule inhibitor and application method thereof in thin film deposition 合肥安德科铭半导体科技有限公司 2024-08-16 CN disclosed
US-20240240319-A1 FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD CV RESEARCH CORPORATION (JP) 2024-07-18 US disclosed
CN-107428677-B Diazadienyl compound, raw material for forming thin film, method for producing thin film, and diazadiene compound 株式会社ADEKA 2022-04-05 CN disclosed
CN-109923119-B Compound, raw material for forming thin film, method for producing thin film, and amidine compound 株式会社ADEKA 2022-03-18 CN disclosed
CN-109715601-B Diazadienyl compound, raw material for forming thin film, and method for producing thin film 株式会社ADEKA 2022-02-25 CN disclosed