Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL29008268 | 0.96 | TDP1 (0.39) | TDP1MAPK1 | |
| Acetic Acid SCHEMBL25433340 | 0.96 | TDP1 (0.44) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Acetic Acid SCHEMBL36448 | 0.96 | TDP1 (0.44) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Acetic Acid SCHEMBL8843133 | 0.96 | TDP1 (0.44) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Acetic Acid SCHEMBL29057384 | 0.93 | TDP1 (0.37) | TDP1MAPK1 | |
| Acetic Acid SCHEMBL20210837 | 0.92 | TDP1 (0.46) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Acetic Acid SCHEMBL10713831 | 0.92 | TDP1 (0.46) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Acetic Acid SCHEMBL29081106 | 0.91 | TDP1 (0.38) | TDP1MAPK1 | |
| Bicarbonate SCHEMBL25422186 | 0.90 | TDP1 (0.45) | TDP1MAPK1MAPTLMNAHSD17B10 | |
| Methoxymethane SCHEMBL183011 | 0.89 | TDP1 (0.48) | TDP1MAPK1LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 434 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11939459-B2 | Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-03-26 | — | — | US | claimed |
| CN-113166294-B | Photosensitive resin composition, method for producing fluorine-containing resin cured product, fluorine-containing resin film, bank, and display element | 中央硝子株式会社 | 2024-01-12 | — | — | CN | claimed |
| US-20230027085-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT OF FLUORORESIN, FLUORORESIN, FLUORORESIN FILM, BANK AND DISPLAY ELEMENT | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-01-26 | — | — | US | claimed |
| CN-113166294-A | Photosensitive resin composition, method for producing cured fluororesin, fluororesin film, bank, and display element | 中央硝子株式会社 | 2021-07-23 | — | — | CN | claimed |
| CN-118344769-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学工业株式会社 | 2024-07-16 | — | — | CN | disclosed |
| CN-118339509-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118302462-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118290880-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-107533259-B | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学工业株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118043732-A | Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer | 日产化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| US-20240132730-A1 | LIQUID-REPELLING AGENT, CURABLE COMPOSITION, CURED PRODUCT, DIVIDING WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, METHOD FOR PRODUCING FLUORINE-CONTAINING COATING FILM, AND FLUORINE-CONTAINING COATING FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-25 | — | — | US | disclosed |
| CN-111512221-B | Method for manufacturing zero-face anchor film and liquid crystal display element | 日产化学株式会社 | 2024-04-09 | — | — | CN | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| US-20080020321-A1 | Positive Type Resist Composition, Process for Forming Resist Pattern, and Process for Performing Ion Implantation | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-20060172206-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-08-03 | — | — | US | disclosed |
| US-20050227169-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| US-20050095530-A1 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-05 | — | — | US | disclosed |
| EP-1508835-A2 | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2005-02-23 | — | — | EP | disclosed |
| CN-1584631-A | Dye-containing resist composition and color filter using same | NISSAN CHEMICAL IND LTD (JP) | 2005-02-23 | — | — | CN | disclosed |