SCHEMBL29449239

SCHEMBL29449239

CCCCC[Si](C)(C)N[Si](C)(C)CCCCC

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.39
THRB P10828 1/20 0.39
ALDH1A1 P00352 3/20 0.36
EPHX1 P07099 6/20 0.33
LMNA P02545 3/20 0.33
SLC22A1 O15245 2/20 0.32
SLC22A2 O15244 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
FAAH O00519 1/20 0.31
DNM1 Q05193 2/20 0.30
HSD17B10 Q99714 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29449226 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449253 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449262 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449256 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL21385113 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449230 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449234 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449225 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL6027614 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA
SCHEMBL29449258 0.97 TSHR (0.44) TSHRTHRBALDH1A1EPHX1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117999324-A Antifouling coating composition 中国涂料株式会社 2024-05-07 CN disclosed
CN-117840009-A Method for forming coating film of photocurable fluoropolyether elastomer composition 信越化学工业株式会社 2024-04-09 CN disclosed
CN-113165012-B Method for forming coating film of photocurable fluoropolyether elastomer composition 信越化学工业株式会社 2024-01-30 CN disclosed
US-11282709-B2 Chemical agent for forming water repellent protective film and surface treatment method for wafers CENTRAL GLASS COMPANY, LIMITED (JP) 2022-03-22 US disclosed