SCHEMBL29488302

SCHEMBL29488302

Nc1cc(C2(c3ccc(O)c(N)c3)c3ccccc3-c3ccccc32)ccc1O

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.65
ESR2 Q92731 1/20 0.65
MEN1 O00255 7/20 0.61
KMT2A Q03164 7/20 0.61
MAPT P10636 6/20 0.61
LMNA P02545 4/20 0.61
SMN1; SMN2 Q16637 4/20 0.61
KDM4E B2RXH2 2/20 0.61
OPRK1 P41145 1/20 0.61
ALDH1A1 P00352 5/20 0.43
ALOX15 P16050 4/20 0.43
GAA P10253 4/20 0.43
HSD17B10 Q99714 3/20 0.43
HPGD P15428 3/20 0.43
ALOX12 P18054 3/20 0.43
HTT P42858 2/20 0.43
USP2 O75604 1/20 0.43
HSP90AA1 P07900 1/20 0.43
POLB P06746 3/20 0.40
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31220287 1.00 ESR1 (0.65) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL1482551 1.00 ESR1 (0.65) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL31296636 1.00 ESR1 (0.65) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL8984558 0.94 ESR1 (0.58) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL4240467 0.86 ESR1 (0.60) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL16819102 0.85 ESR1 (0.49) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL20445906 0.85 ESR1 (0.49) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL31544678 0.84 MEN1 (0.51) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL5038739 0.84 MEN1 (0.51) ESR1ESR2MEN1KMT2AMAPT
SCHEMBL6138389 0.83 MEN1 (0.62) ESR1ESR2MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119264429-A Low-dielectric fluorine-containing silane modified polyimide and application thereof 山东非金属材料研究所 2025-01-07 CN claimed
CN-118930858-A High-dielectric high-temperature-resistant polyetherimide dielectric film and preparation method and application thereof 南方电网科学研究院有限责任公司 2024-11-12 CN claimed
CN-118725295-A Resin, preparation method and application of resin 华为技术有限公司 2024-10-01 CN claimed
CN-115232017-B Compound, resin and preparation method and application thereof 华为技术有限公司 2024-06-18 CN claimed
CN-117987075-A Adhesive with high binding force for lithium ion secondary battery and preparation method thereof 桂林电器科学研究院有限公司 2024-05-07 CN claimed
CN-116003778-A Preparation method of polyaryletherketone resin containing amino side group, polyaryletherketone resin containing amino side group and application 中国科学院大连化学物理研究所 2023-04-25 CN claimed
CN-115746231-A High-temperature-resistant and easy-to-process benzoxazole resin and preparation method and application thereof 中国科学院宁波材料技术与工程研究所 2023-03-07 CN claimed
CN-115692709-A Negative electrode slurry for lithium ion battery and preparation method thereof 桂林电器科学研究院有限公司 2023-02-03 CN claimed
CN-115626890-A Diamine monomer with bulky alkynyl side group and preparation method and application thereof 波米科技有限公司 2023-01-20 CN claimed
CN-115232017-A Compound, resin, and preparation method and application thereof 华为技术有限公司 2022-10-25 CN claimed
CN-111499901-B Preparation method of fluorine-containing polymer/polyimide composite film 东莞东阳光科研发有限公司 2022-07-08 CN claimed
CN-122029216-A Polyhydroxy amide compound, negative photosensitive resin composition, dry film, cured product, and electronic component 太阳控股株式会社 2026-05-12 CN disclosed
CN-122029489-A Photosensitive resin composition, cured product, display device, and electronic component 东丽株式会社 2026-05-12 CN disclosed
US-20250205939-A1 ANNULAR SEAL MATERIAL AND MANUFACTURING METHOD VALQUA, LTD. (JP) 2025-06-26 US disclosed
WO-2025128306-A1 INDANE BIS-O-AMINOPHENOLS AND POLYMERS PREPARED THEREFROM FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-06-19 WO disclosed
CN-114721223-A Photosensitive resin, photosensitive resin composition, cured product, pattern forming method, and integrated circuit device 华为技术有限公司 2022-07-08 CN disclosed
CN-114488695-A Photoresist lower layer material composition, preparation method thereof and photoresist lower coating 苏州理硕科技有限公司 2022-05-13 CN disclosed
CN-109219593-B Maleimide compound containing substituted or unsubstituted allyl group, process for producing the same, and composition and cured product using the same DIC株式会社 2022-04-22 CN disclosed
CN-110734736-B Adhesive for temporary bonding, adhesive layer, wafer processed body, and method for manufacturing semiconductor device using same 东丽株式会社 2022-04-19 CN disclosed
WO-2022070946-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED PRODUCT 東レ株式会社 2022-04-07 WO disclosed