Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | PTGER4 | P35408 | 3/20 | 0.40 |
| ▸ | CNR1 | P21554 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | LDLR | P01130 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 2/20 | 0.37 |
| ▸ | ACHE | P22303 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL22497411 | 1.00 | KDM4E (0.41) | KDM4ELMNAMAPTHPGDHTT | |
| Acetic Acid SCHEMBL29503053 | 0.99 | KDM4E (0.42) | KDM4ELMNAMAPTHPGDHTT | |
| Acetic Acid SCHEMBL26646497 | 0.99 | KDM4E (0.42) | KDM4ELMNAMAPTHPGDHTT | |
| Benzoic Acid SCHEMBL29503080 | 0.94 | PTGER4 (0.42) | KDM4ELMNAMAPTHPGDHTT | |
| Benzoic Acid SCHEMBL28470922 | 0.94 | PTGER4 (0.42) | KDM4ELMNAMAPTHPGDHTT | |
| SCHEMBL16548356 | 0.87 | KMT2A (0.38) | KDM4ELMNAMAPTHPGDHTT | |
| SCHEMBL21253182 | 0.87 | KMT2A (0.38) | KDM4ELMNAMAPTHPGDHTT | |
| SCHEMBL19632436 | 0.87 | KMT2A (0.38) | KDM4ELMNAMAPTHPGDHTT | |
| SCHEMBL29378382 | 0.87 | KMT2A (0.38) | KDM4ELMNAMAPTHPGDHTT | |
| SCHEMBL31650942 | 0.87 | KMT2A (0.38) | KDM4ELMNAMAPTHPGDHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111752096-B | Photosensitive resin composition for color filter and color filter | 常州正洁智造科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-115128899-A | Photosensitive resin composition with improved system hue stability | 常州正洁智造科技有限公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-111752091-B | Application of HABI mixed photoinitiator in UVLED photocuring | 常州正洁智造科技有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-112835261-B | EO/PO modified 9-phenylacridine photosensitizer and application thereof | 常州强力电子新材料股份有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-114442425-A | Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board | 常州正洁智造科技有限公司 | 2022-05-06 | — | — | CN | disclosed |
| WO-2022089228-A1 | CURABLE RESIN COMPOSITION AND SOLDER RESIST FILM FORMED THEREFROM, INTERLAYER INSULATING MATERIAL, AND PRINTED CIRCUIT BOARD | 常州正洁智造科技有限公司 | 2022-05-05 | — | — | WO | disclosed |
| CN-114326299-A | Photosensitive resin composition, optical filter and application | 常州强力电子新材料股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114326309-A | Photosensitive resin composition and application thereof | 常州正洁智造科技有限公司 | 2022-04-12 | — | — | CN | disclosed |