SCHEMBL295866

SCHEMBL295866

C=CC[Si](C)(C)O[Si](C)(C)CC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2153145 0.97
Ethylene Glycol SCHEMBL9801862 0.89 TSHR (0.32)
SCHEMBL25175275 0.88
SCHEMBL26081553 0.88
SCHEMBL16858297 0.86
SCHEMBL28207708 0.86
SCHEMBL15745731 0.85 TSHR (0.31)
SCHEMBL17999662 0.82
SCHEMBL7899245 0.82
SCHEMBL13822338 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 659 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106343-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-22 WO claimed
US-20250157825-A1 ETCHING METHODS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-05-15 US claimed
US-20240258111-A1 Surface Treatment Compositions and Methods FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-08-01 US claimed
US-20230078587-A1 CURABLE SILOXANE RESIN COMPOSITION KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-03-16 US claimed
CN-115678012-A Multi-terminal alkylene branched polysiloxane and preparation method and application thereof 中科院广州化学有限公司 2023-02-03 CN claimed
US-11447642-B2 Methods of using surface treatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-09-20 US claimed
WO-2022154598-A1 PLATE FOR PRODUCING STEM CELL SPHEROID AND METHOD FOR PRODUCING STEM CELL SPHEROID BY USING SAME 한국과학기술원 2022-07-21 WO claimed
US-11174394-B2 Surface treatment compositions and articles containing same FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
EP-3830196-A1 SURFACE TREATMENT COMPOSITIONS AND METHODS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2021-06-09 EP claimed
US-20210122925-A1 METHODS OF USING SURFACE TREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2021-04-29 US claimed
US-20040035791-A1 Formation of hydrophilic sites in partially silylated micelle templated silica UNIVERSITE LAVAL (CA) 2004-02-26 US claimed
US-20030212234-A1 Interpenetrating polymer networks; particle reinforcement 3M INNOVATIVE PROPERTIES COMPANY 2003-11-13 US claimed
US-6646089-B2 Having a plurality of each of at least two different types of functional groups, such as vinyl or allyl groups and hydrolyzable groups MICHIGAN MOLECULAR INSTITUTE 2003-11-11 US claimed
WO-2003068781-A1 METHOD FOR THE PRODUCTION OF ALLYL SILYL ETHER Consortium für elektrochemische Industrie GmbH (DE) 2003-08-21 WO claimed
US-20030088024-A1 Having a plurality of each of at least two different types of functional groups, such as vinyl or allyl groups and hydrolyzable groups 3M INNOVATIVE PROPERTIES COMPANY 2003-05-08 US claimed
EP-1300434-A2 Hyperbranched polymers with latent functionality and methods of making same Michigan Molecular Institute (US) 2003-04-09 EP claimed
US-6136874-A Microporous polymeric foams made with silicon or germanium based monomers THE PROCTER & GAMBLE COMPANY (US) 2000-10-24 US claimed
US-5969039-A MIXING POLYSILOXANE HAVING SILICON-BONDED ALKENYL GROUPS AND POLYSILOXANE HAVING SILICON-BONDED HYDROGEN ATOMS IN WATER IN PRESENCE OF SURFACTANT, ADDING PLATINUM-ALKENYLSILOXANE COMPLEX CATALYST, CURING, SEPARATING POWDER FORMED DOW CORNING TORAY SILICONE CO., LTD. (JP) 1999-10-19 US claimed
EP-0461597-B1 Method for preparing monohalogenosilanes SHINETSU CHEMICAL CO (JP) 1995-03-01 EP claimed
EP-0461597-A2 Method for preparing monohalogenosilanes Shin-Etsu Chemical Co., Ltd. (JP) 1991-12-18 EP claimed