SCHEMBL2959387

SCHEMBL2959387

COc1ccccc1Cc1nc2ccc(-c3nn([C@H]4CC[C@@H](N5CCN(CC6CC6)CC5)CC4)c4ncnc(N)c34)cc2[nH]1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ IGF1R P08069 20/20 1.00
▸ EGFR P00533 11/20 1.00
▸ ERBB2 P04626 11/20 1.00
▸ CYP2D6 P10635 1/20 0.82

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2967949 1.00 IGF1R (1.00) IGF1REGFRERBB2CYP2D6
SCHEMBL2966892 1.00 IGF1R (1.00) IGF1REGFRERBB2CYP2D6
SCHEMBL2962503 0.93 IGF1R (0.88) IGF1REGFRERBB2CYP2D6
SCHEMBL2962500 0.93 IGF1R (0.88) IGF1REGFRERBB2CYP2D6
SCHEMBL2969343 0.93 IGF1R (0.88) IGF1REGFRERBB2CYP2D6
SCHEMBL2961140 0.92 IGF1R (0.86) IGF1REGFRERBB2CYP2D6
SCHEMBL2961138 0.92 IGF1R (0.86) IGF1REGFRERBB2CYP2D6
SCHEMBL2956062 0.92 IGF1R (0.93) IGF1REGFRERBB2CYP2D6
SCHEMBL2958515 0.92 IGF1R (0.93) IGF1REGFRERBB2CYP2D6
SCHEMBL2956060 0.92 IGF1R (0.93) IGF1REGFRERBB2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114561170-B Insulating adhesive film and preparation method and application thereof 深圳市纽菲斯新材料科技有限公司 2023-08-08 — — CN claimed
CN-113801473-B Wave-absorbing bismaleimide resin, wave-absorbing bismaleimide resin composite material and preparation method thereof 航天特种材料及工艺技术研究所 2023-06-09 — — CN claimed
CN-116178717-A Preparation of modified bismaleimide resin 华东理工大学 2023-05-30 — — CN claimed
CN-116042157-A Low-dielectric flame-retardant lamination adhesive film for FCBGA packaging carrier plate and preparation method thereof 深圳市纽菲斯新材料科技有限公司 2023-05-02 — — CN claimed
EP-1973917-B1 PROTEIN KINASE INHIBITORS ABBVIE INC (US) 2015-06-10 — — EP claimed
US-7772231-B2 Substituted pyrazolo[3,4-d]pyrimidines as protein kinase inhibitors ABBOTT LABORATORIES (US) 2010-08-10 — — US claimed
JP-55118436-A — — None — — JP disclosed
US-20240209148-A1 RESIN COMPOSITION FOR LOW-DIELECTRIC MATERIAL, FILM FOR MULTILAYER SUBSTRATE, MULTILAYER SUBSTRATE, METHOD FOR PRODUCING RESIN COMPOSITION FOR LOW-DIELECTRIC MATERIAL, METHOD FOR PRODUCING FILM FOR MULTILAYER SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER SUBSTRATE NATIONAL UNIVERSITY CORPORATION, IWATE UNIVERSITY (JP) 2024-06-27 — — US disclosed
US-11975507-B2 Thermosetting resin composition, prepreg containing same, metal foil-clad laminate and printed circuit board SHENGYI TECHNOLOGY CO., LTD. (CN) 2024-05-07 — — US disclosed
CN-111656874-B Multilayer printed circuit board, method for manufacturing the same, and semiconductor device using the same 株式会社LG化学 2024-01-26 — — CN disclosed
CN-114181652-B Insulating adhesive film with low dielectric loss and preparation method and application thereof 深圳市纽菲斯新材料科技有限公司 2024-01-09 — — CN disclosed
CN-110637256-B Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern forming method 三菱瓦斯化学株式会社 2024-01-09 — — CN disclosed
CN-111601850-B Thermosetting resin composition for semiconductor encapsulation, prepreg and metal clad laminate using the same 株式会社LG化学 2024-01-02 — — CN disclosed
US-5948149-A SEMI-POLAR DIGLYCERIN BORATE ADDITIVE COMPOUND EXHIBITS SUPERIOR WETTABILITY, SURFACE TENSION, AND ANTIBACTERIAL PROPERTIES SONY CORPORATION (JP) 1999-09-07 — — US disclosed
US-4840869-A 2-HALOMETHYL-1,3,4-OXADIAZOLE COMPOUNDS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-06-20 — — US disclosed
EP-0118766-B1 LIGHT-SENSITIVE COMPOSITION KONICA CORPORATION (JP) 1989-01-04 — — EP disclosed
EP-0118766-A2 Light-sensitive composition KONICA CORPORATION (JP) 1984-09-19 — — EP disclosed
JP-S55118436-A PREPARATION OF 2-TERTIARY-ALKYL-SUBSTITUTED ANTHRAQUINONE MITSUBISHI GAS CHEM CO INC 1980-09-11 — — JP disclosed
US-4098114-A Recording sheet FUJI PHOTO FILM CO., LTD. (JP) 1978-07-04 — — US disclosed
US-4073968-A IRRADIATING A PHOTOCURABLE COMPOSITION FUJI PHOTO FILM CO., LTD. (JA) 1978-02-14 — — US disclosed
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