SCHEMBL29618973

SCHEMBL29618973

Fc1ccc(C2(c3ccc(F)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.63
KMT2A Q03164 2/20 0.63
KDM4E B2RXH2 1/20 0.63
LMNA P02545 1/20 0.63
MAPT P10636 1/20 0.63
OPRK1 P41145 1/20 0.63
SMN1; SMN2 Q16637 1/20 0.63
ESR1 P03372 1/20 0.47
ESR2 Q92731 1/20 0.47
KIF11 P52732 1/20 0.45
PDK2 Q15119 5/20 0.43
POLB P06746 1/20 0.42
PGR P06401 1/20 0.38
NPSR1 Q6W5P4 1/20 0.37
KDR P35968 1/20 0.36
NPY5R Q15761 1/20 0.36
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
THRB P10828 1/20 0.34
TDP1 Q9NUW8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564768 1.00 MEN1 (0.63) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL9226927 0.90 MEN1 (0.53) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL30516188 0.83 MEN1 (0.71) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL14122566 0.83 MEN1 (0.71) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL19735666 0.83 MEN1 (0.46) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL13645436 0.82 PDK2 (0.53) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL23696735 0.82 MEN1 (0.45) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL11892478 0.82 MEN1 (0.45) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL11892474 0.82 MEN1 (0.49) MEN1KMT2AKDM4ELMNAMAPT
SCHEMBL10053596 0.81 PDK2 (0.50) MEN1KMT2AKDM4ELMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115028808-A Polymer material, method for producing the same, composition, optical member and device 华为技术有限公司 2022-09-09 CN disclosed
WO-2022107759-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2022-05-27 WO disclosed