SCHEMBL29637824

SCHEMBL29637824

CN(C)Cc1ccc(Nc2ccc(N)c3c2C(=O)c2ccccc2C3=O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 5/20 0.50
▸ KMT2A Q03164 5/20 0.50
▸ MAPT P10636 3/20 0.50
▸ TDP1 Q9NUW8 3/20 0.50
▸ MAPK1 P28482 2/20 0.50
▸ RAB9A P51151 2/20 0.50
▸ NPSR1 Q6W5P4 2/20 0.50
▸ L3MBTL1 Q9Y468 2/20 0.50
▸ NPC1 O15118 1/20 0.50
▸ LMNA P02545 1/20 0.50
▸ ADORA2A P29274 3/20 0.47
▸ CSNK1A1 P48729 2/20 0.47
▸ CSNK1D P48730 2/20 0.47
▸ CSNK1G1 Q9HCP0 2/20 0.47
▸ FGR P09769 1/20 0.47
▸ PIM1 P11309 1/20 0.47
▸ MAOA P21397 1/20 0.47
▸ DYRK1A Q13627 1/20 0.47
▸ HIPK2 Q9H2X6 1/20 0.47
▸ P2RY4 P51582 4/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2871232 1.00 MEN1 (0.50) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL10811745 0.89 MEN1 (0.44) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL10940967 0.87 P2RY4 (0.50) MEN1KMT2AMAPK1ADORA2ACSNK1A1
SCHEMBL11540883 0.86 P2RY4 (0.61) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL13717469 0.85 P2RY12 (0.57) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL10809232 0.81 P2RY4 (0.60) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL4704714 0.81 ADORA2A (0.59) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL10812203 0.81 SLC6A4 (0.55) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL30918998 0.81 ADORA2A (0.63) MEN1KMT2AMAPTTDP1MAPK1
SCHEMBL169365 0.81 ADORA2A (0.63) MEN1KMT2AMAPTTDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12359081-B2 Ink, method for producing ink, and inkjet system RICOH COMPANY, LTD. (JP) 2025-07-15 — — US disclosed
CN-111094474-B Near-infrared-curable ink composition, near-infrared-curable film, method for producing near-infrared-curable film, and method for photo-molding 住友金属矿山株式会社 2022-06-07 — — CN disclosed
US-20220169877-A1 INK, METHOD FOR PRODUCING INK, AND INKJET SYSTEM RICOH COMPANY, LTD. (JP) 2022-06-02 — — US disclosed
Send feedback