SCHEMBL29640486

SCHEMBL29640486

Oc1ccc(O)c2c(O)cccc12

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 1.00
HSD17B10 Q99714 4/20 1.00
ALOX15 P16050 3/20 1.00
RECQL P46063 3/20 1.00
TDP1 Q9NUW8 3/20 1.00
MAPT P10636 3/20 1.00
APP P05067 1/20 1.00
THRB P10828 1/20 1.00
TSHR P16473 1/20 1.00
CASP1 P29466 1/20 1.00
SNCA P37840 1/20 1.00
IDO1 P14902 3/20 0.58
CYP1A2 P05177 2/20 0.55
IMPDH2 P12268 1/20 0.48
IMPDH1 P20839 1/20 0.48
ALDH1A1 P00352 4/20 0.45
EGFR P00533 3/20 0.45
LMNA P02545 3/20 0.45
CDK2 P24941 2/20 0.45
CA2 P00918 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2407577 1.00 HPGD (1.00) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL20518530 0.83 HPGD (0.71) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL14998896 0.83 MAPT (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL29771840 0.83 MAPT (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL16558498 0.83 HPGD (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL24358411 0.83 TSHR (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL5522395 0.83 HPGD (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL7299430 0.83 HPGD (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL15892260 0.82 RECQL (0.70) HPGDHSD17B10ALOX15RECQLTDP1
SCHEMBL10884065 0.82 RECQL (0.70) HPGDHSD17B10ALOX15RECQLTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119529785-B Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-04-08 CN claimed
CN-119529785-A Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-02-28 CN claimed
CN-119306921-A Naphthalene epoxy resin, preparation method thereof, naphthalene epoxy resin composition and application 华为技术有限公司 2025-01-14 CN claimed
WO-2024106711-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME 와이씨켐 주식회사 2024-05-23 WO claimed
CN-116097398-A Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same 荣昌化学制品株式会社 2023-05-09 CN claimed
EP-3857220-B1 METHOD, DEVICE AND INDICATOR FOR LOCALIZING DAMAGE BY OVERHEATING 4GENE GMBH (DE) 2023-01-18 EP claimed
CN-115252588-A Application of 1, 4-hydroquinone and/or 1, 4-hydroquinone derivative in preparation of anti-novel coronavirus medicines 山东达因海洋生物制药股份有限公司 2022-11-01 CN claimed
CN-114450640-A Process liquid composition for lithography and pattern formation method using the same 荣昌化学制品株式会社 2022-05-06 CN claimed
CN-120019333-A Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same YC化学制品株式会社 2025-05-16 CN disclosed
CN-119529785-B Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-04-08 CN disclosed
CN-119529785-B Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-04-08 CN disclosed
CN-119529785-A Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-02-28 CN disclosed
CN-119529785-A Aggravated high-temperature-resistant high-salt-resistant gel and preparation method and application thereof 成都西油华巍科技有限公司 2025-02-28 CN disclosed
CN-119306921-A Naphthalene epoxy resin, preparation method thereof, naphthalene epoxy resin composition and application 华为技术有限公司 2025-01-14 CN disclosed
CN-112119104-B Epoxy (meth) acrylate resin composition, curable resin composition, cured product, and article DIC株式会社 2023-09-29 CN disclosed
CN-116097398-A Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same 荣昌化学制品株式会社 2023-05-09 CN disclosed
EP-3857220-B1 METHOD, DEVICE AND INDICATOR FOR LOCALIZING DAMAGE BY OVERHEATING 4GENE GMBH (DE) 2023-01-18 EP disclosed
CN-115252588-A Application of 1, 4-hydroquinone and/or 1, 4-hydroquinone derivative in preparation of anti-novel coronavirus medicines 山东达因海洋生物制药股份有限公司 2022-11-01 CN disclosed
CN-114450640-A Process liquid composition for lithography and pattern formation method using the same 荣昌化学制品株式会社 2022-05-06 CN disclosed
CN-114258511-A Curable composition, cured product, and method for forming insulating film 东京应化工业株式会社 2022-03-29 CN disclosed