SCHEMBL29670992

SCHEMBL29670992

C=CC(=O)OCC(CCCCCCCCCCCC)OC(=O)C=C

nearest known ligand 0.56

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.56
HPGD P15428 1/20 0.50
ALDH1A1 P00352 2/20 0.44
LMNA P02545 1/20 0.44
CYP3A4 P08684 1/20 0.42
PRKCA P17252 4/20 0.41
PRKCE Q02156 2/20 0.41
PRKCQ Q04759 2/20 0.41
PRKCD Q05655 2/20 0.41
ZDHHC7 Q9NXF8 1/20 0.39
HCAR2 Q8TDS4 1/20 0.38
MAPT P10636 1/20 0.38
FAAH O00519 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29486060 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL6558984 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL27370426 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL29670983 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL29670997 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL27370863 1.00 TSHR (0.56) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL4964017 0.94 TSHR (0.64) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL30690805 0.93 TSHR (0.50) TSHRHPGDALDH1A1LMNACYP3A4
SCHEMBL7125959 0.89 TSHR (0.48) TSHRHPGDALDH1A1CYP3A4ZDHHC7
SCHEMBL7649106 0.89 TSHR (0.48) TSHRHPGDALDH1A1CYP3A4ZDHHC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT ADEKA CORPORATION (JP) 2022-05-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 TSHR 4534/4885HPGD 1143/4885ALDH1A1 323/4885
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT H1-0, H1-10, RAD51 TSHR 4592/4885HPGD 1263/4885ALDH1A1 367/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.