Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 6/20 | 0.50 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | CCR1 | P32246 | 1/20 | 0.37 |
| ▸ | CCR8 | P51685 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | CASP1 | P29466 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | CASP7 | P55210 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6650976 | 0.83 | CYP1A2 (0.48) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL6274090 | 0.83 | CYP2A6 (0.45) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL459684 | 0.79 | CYP1A2 (0.56) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL27486426 | 0.79 | CYP1A2 (0.45) | CYP1A2CYP2A6ALDH1A1HSD17B10HPGD | |
| SCHEMBL16283929 | 0.79 | CYP1A2 (0.42) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL10630656 | 0.77 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL10630661 | 0.77 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| Ammonia Solution, Strong SCHEMBL4639022 | 0.77 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| Hydrochloric Acid SCHEMBL28848790 | 0.77 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL119090 | 0.76 | CYP1A2 (0.56) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| CN-115113482-A | Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-09-27 | — | — | CN | disclosed |
| WO-2021079679-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2021-04-29 | — | — | WO | disclosed |
| CN-107615168-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2018-01-19 | — | — | CN | disclosed |
| CN-103797418-B | A kind of negative light-sensitive resin combination, pattern formation method, cured film, dielectric film, colour filter and display device | 东京应化工业株式会社 | 2017-06-13 | — | — | CN | disclosed |
| CN-106019841-A | Photosensitive resin composition, pattern forming method, cured film, insulation film, color filter and display device | 东京应化工业株式会社 | 2016-10-12 | — | — | CN | disclosed |
| CN-105676601-A | Pretreatment method of glass substrate used for forming etching mask | 东京应化工业株式会社 | 2016-06-15 | — | — | CN | disclosed |
| CN-103163730-B | Chemical amplification type photoetching compositions is utilized to carry out the method for minor groove patterning | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (CN) | 2016-03-09 | — | — | CN | disclosed |
| CN-105283432-A | Composition comprising a compound containing a vinyl group | TOKYO OHKA KOGYO CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | disclosed |
| CN-1983031-A | Photosensitive resin composition for organic light emitting diodes | DONGJIN SEMICHEM CO LTD (KR) | 2007-06-20 | — | — | CN | disclosed |
| CN-1825206-A | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-08-30 | — | — | CN | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |
| CN-1607461-A | Resist polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2005-04-20 | — | — | CN | disclosed |
| CN-1578794-A | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | DUPONT ELECTRONIC TECHNOLOGIES (US) | 2005-02-09 | — | — | CN | disclosed |
| CN-1550896-A | Processes for preparing photoresist compositions and the product | ��Ļ���Ű˾ | 2004-12-01 | — | — | CN | disclosed |