SCHEMBL296997

SCHEMBL296997

C[SiH2]CC[SiH2]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3753028 0.82
SCHEMBL17711111 0.78
SCHEMBL708104 0.78
SCHEMBL9637561 0.75
SCHEMBL28952772 0.75
SCHEMBL68461 0.75
SCHEMBL28838315 0.75
SCHEMBL28966194 0.73
SCHEMBL15150843 0.73
SCHEMBL23701073 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103773084-A Preparation method for synthesizing sheet-type cladding material by fluidized bed gas-phase method UNIV FUJIAN 2014-05-07 CN claimed
US-8530361-B2 Process for producing silicon and oxide films from organoaminosilane precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-10 US claimed
EP-2287231-B1 Ulltraviolet transmissive polyhedral silsesquioxane polymers PANASONIC CORP (JP) 2012-06-06 EP claimed
US-20110262642-A1 Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-10-27 US claimed
US-20110251357-A1 ULTRAVIOLET TRANSMISSIVE POLYHEDRAL SILSESQUIOXANE POLYMERS PANASONIC ELECTRIC WORKS CO., LTD. 2011-10-13 US claimed
EP-2287231-A2 Ulltraviolet transmissive polyhedral silesquioxane polymers Panasonic Electric Works Co., Ltd. (JP) 2011-02-23 EP claimed
CN-101098911-A Ultraviolet transmissive polyhedral silsequioxane polymers MATSUSHITA ELECTRIC WORKS LTD (JP) 2008-01-02 CN claimed
US-20060122351-A1 Ultraviolet transmissive polyhedral silsesquioxane polymers PANASONIC ELECTRIC WORKS CO., LTD. (JP) 2006-06-08 US claimed
US-20030139035-A1 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (pecvd) APPLIED MATERIALS, INC. 2003-07-24 US claimed
US-5744196-A Low temperature deposition of silicon dioxide using organosilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-04-28 US claimed
EP-0721019-A2 Low temperature deposition of silicon dioxide using organosilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-07-10 EP claimed
US-12584212-B2 Compositions and methods using same for germanium seed layer VERSUM MATERIALS US, LLC (US) 2026-03-24 US disclosed
US-20250183029-A1 ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME VERSUM MAT US LLC (US) 2025-06-05 US disclosed
US-12230496-B2 Organoaminosilane precursors and methods for depositing films comprising same VERSUM MATERIALS US, LLC (US) 2025-02-18 US disclosed
EP-4425179-A2 COMPOSITIONS AND METHODS FOR ENHANCED FLUORESCENCE Life Technologies Corporation (US) 2024-09-04 EP disclosed
CN-101098911-A Ultraviolet transmissive polyhedral silsequioxane polymers MATSUSHITA ELECTRIC WORKS LTD (JP) 2008-01-02 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060122351-A1 Ultraviolet transmissive polyhedral silsesquioxane polymers PANASONIC ELECTRIC WORKS CO., LTD. (JP) 2006-06-08 US disclosed
US-5744196-A Low temperature deposition of silicon dioxide using organosilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 1998-04-28 US disclosed
EP-0721019-A2 Low temperature deposition of silicon dioxide using organosilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-07-10 EP disclosed