⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1746181 | 0.86 | SLC6A2 (0.42) | — | |
| SCHEMBL11652607 | 0.82 | SLC6A2 (0.40) | — | |
| SCHEMBL49736 | 0.78 | — | — | |
| SCHEMBL3861660 | 0.78 | — | — | |
| SCHEMBL302007 | 0.78 | — | — | |
| SCHEMBL23710060 | 0.78 | — | — | |
| SCHEMBL197402 | 0.78 | — | — | |
| SCHEMBL20878692 | 0.78 | — | — | |
| SCHEMBL20878691 | 0.78 | — | — | |
| SCHEMBL13575909 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021054459-A1 | BENZOTRIAZOLE COMPOUND, LIGHT ABSORBER, AND RESIN COMPOSITION | 三井化学株式会社 | 2021-03-25 | — | — | WO | disclosed |
| CN-104583195-B | Nitrogenous heteroaromatic ring derivative as tyrosine kinase inhibitor | 山东亨利医药科技有限责任公司 | 2018-08-17 | — | — | CN | disclosed |
| CN-103210047-B | The diazene * dioxide of the substitution containing N and/or the aqueous polishing composition of N '-hydroxyls-diazene * oxide salts | 巴斯夫欧洲公司 | 2018-07-17 | — | — | CN | disclosed |
| EP-2331649-B1 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2018-06-13 | — | — | EP | disclosed |
| CN-103249424-B | For treating and preventing the novel cyclosporin derivatives of virus infection | 河北鲲翔济世医药科技有限公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-103298474-B | Heterocyclic compound and application thereof | 无限药品股份有限公司 | 2016-06-29 | — | — | CN | disclosed |
| CN-1742066-B | The siliceous dielectric method of polishing | CABOT MICROELECTRONICS CORP. (US) | 2015-10-21 | — | — | CN | disclosed |
| CN-103080256-B | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE | 2015-06-24 | — | — | CN | disclosed |
| CN-104583195-A | Nitrogen-containing heteroaromatic ring derivative as tyrosine kinase inhibitor | KBP BIOSCIENCES CO LTD | 2015-04-29 | — | — | CN | disclosed |
| US-8597540-B2 | Compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2013-12-03 | — | — | US | disclosed |
| US-20060196848-A1 | Readily deinkable toners | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2006-09-07 | — | — | US | disclosed |
| US-20060144824-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-06 | — | — | US | disclosed |
| US-7071105-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-04 | — | — | US | disclosed |
| CN-1742066-A | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORP (US) | 2006-03-01 | — | — | CN | disclosed |
| EP-1601735-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | Cabot Microelectronics Corporation (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004069947-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2004-08-19 | — | — | WO | disclosed |
| US-20040152309-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION | 2004-08-05 | — | — | US | disclosed |
| EP-0026520-B1 | PHOTOGRAPHIC SILVER HALIDE DEVELOPMENT IN THE PRESENCE OF THIOETHER DEVELOPMENT ACTIVATORS; METHOD, DEVELOPER AND PHOTOGRAPHIC ELEMENT | AGFA-GEVAERT N.V. (BE) | 1983-09-14 | — | — | EP | disclosed |
| US-4292400-A | Photographic silver halide development in the presence of thioether development activators | AGFA-GEVAERT, N.V. (BE) | 1981-09-29 | — | — | US | disclosed |
| EP-0026520-A1 | Photographic silver halide development in the presence of thioether development activators; method, developer and photographic element | AGFA-GEVAERT N.V. (BE) | 1981-04-08 | — | — | EP | disclosed |