SCHEMBL29776478

SCHEMBL29776478

Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.[Pd+]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22478 0.96 — —
SCHEMBL8591536 0.96 — —
Lithium Ion SCHEMBL1241828 0.92 — —
SCHEMBL7176102 0.92 — —
SCHEMBL6375637 0.92 — —
Silver SCHEMBL607877 0.92 — —
SCHEMBL6376782 0.92 — —
SCHEMBL5495036 0.92 — —
SCHEMBL7208057 0.92 — —
Lithium Ion SCHEMBL133525 0.92 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240321803-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2024-09-26 — — US disclosed
US-20240272551-A1 NEGATIVE-TYPE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2024-08-15 — — US disclosed
WO-2022270527-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE POLMER, CURED FILM AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-12-29 — — WO disclosed
WO-2022270529-A1 NEGATIVE PHOTOSENSITIVE POLYMER, POLYMER SOLUTION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-12-29 — — WO disclosed
WO-2022172988-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE 住友ベークライト株式会社 2022-08-18 — — WO disclosed
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