SCHEMBL29779708

SCHEMBL29779708

CCCCOc1ccc2cc(OCCCC)ccc2c1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.59
CA1 P00915 2/20 0.59
CA2 P00918 2/20 0.59
CA6 P23280 2/20 0.59
CA7 P43166 2/20 0.59
CA9 Q16790 2/20 0.59
CA14 Q9ULX7 2/20 0.59
CA5B Q9Y2D0 2/20 0.59
CA3 P07451 1/20 0.59
CA4 P22748 1/20 0.59
LTA4H P09960 2/20 0.54
KDM4E B2RXH2 1/20 0.54
MAPK1 P28482 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
NR5A1 Q13285 1/20 0.52
AHR P35869 1/20 0.52
CA5A P35218 1/20 0.50
THRA P10827 1/20 0.50
GPBAR1 Q8TDU6 1/20 0.50
CYSLTR2 Q9NS75 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19809314 1.00 CA12 (0.59) CA12CA1CA2CA6CA7
SCHEMBL347009 0.95 CA12 (0.56) CA12CA1CA2CA6CA7
SCHEMBL15772990 0.95 CA12 (0.56) CA12CA1CA2CA6CA7
SCHEMBL29919785 0.95 CA12 (0.56) CA12CA1CA2CA6CA7
SCHEMBL4945033 0.93 NR5A1 (0.62) CA12CA1CA2CA6CA7
SCHEMBL347683 0.93 NR5A1 (0.62) CA12CA1CA2CA6CA7
SCHEMBL10642885 0.93 NR5A1 (0.62) CA12CA1CA2CA6CA7
SCHEMBL29666114 0.91 TDP1 (0.68) CA12CA1CA2CA6CA7
SCHEMBL470925 0.91 TDP1 (0.68) CA12CA1CA2CA6CA7
SCHEMBL22325684 0.90 CA12 (0.59) CA12CA1CA2CA6CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116830039-A Photosensitive resin composition, photosensitive resin sheet, cured product, hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-09-29 CN disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-114730127-B Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-05-12 CN disclosed
CN-114730127-A Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2022-07-08 CN disclosed