SCHEMBL29800

SCHEMBL29800

C=C[CH]C(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5667187 1.00
SCHEMBL5145577 0.72
Butadiene SCHEMBL4649606 0.72
SCHEMBL14964 0.72
SCHEMBL515609 0.71
SCHEMBL690194 0.69
Hydrogen Peroxide SCHEMBL4373439 0.69
SCHEMBL15841374 0.69
Ammonia Solution, Strong SCHEMBL5683389 0.69
Ethylene SCHEMBL11021004 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 500 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240134279-A1 PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-04-25 US claimed
US-20240096623-A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-03-21 US claimed
US-11914301-B2 Photoresist, method of manufacturing a semiconductor device and method of extreme ultraviolet lithography TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2024-02-27 US claimed
US-20230280653-A1 SURFACE TREATMENT TO PHOTOSENSITIVE LAYER TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-09-07 US claimed
US-20230036859-A1 PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-02-02 US claimed
CN-114975086-A Method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2022-08-30 CN claimed
CN-113359391-A Photoresist composition and method for forming photoresist pattern 台湾积体电路制造股份有限公司 2021-09-07 CN claimed
CN-113314402-A Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2021-08-27 CN claimed
CN-113238457-A Photoresist composition and method for forming photoresist pattern 台湾积体电路制造股份有限公司 2021-08-10 CN claimed
US-11073763-B2 Photoresist and method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2021-07-27 US claimed
US-20040034157-A1 Rinse aid surface coating compositions for modifying dishware surfaces THE PROCTER & GAMBLE COMPANY 2004-02-19 US claimed
US-6693071-B2 FOR USE IN AUTOMATIC DISHWASHING APPLIANCES THE PROCTER & GAMBLE COMPANY 2004-02-17 US claimed
WO-2003099983-A1 AUTOMATIC DISHWASHING COMPOSITIONS AND METHODS FOR USE THE PROCTER & GAMBLE COMPANY (US) 2003-12-04 WO claimed
WO-2003097783-A1 AUTOMATIC DISHWAHSING COMPOSITIONS AND METHODS FOR USE THE PROCTER & GAMBLE COMPANY (US) 2003-11-27 WO claimed
US-20030216271-A1 Automatic dishwashing compositions and methods for use with electrochemical cells and/or electrolytic devices PROCTER & GAMBLE COMPANY, THE 2003-11-20 US claimed
US-20020172773-A1 Rinse aid surface coating compositions for modifying dishware surfaces THE PROCTER & GAMBLE COMPANY 2002-11-21 US claimed
US-20020045010-A1 Coating compositions for modifying hard surfaces THE PROCTER & GAMBLE COMPANY 2002-04-18 US claimed
US-5550220-A DIETETICS CURTICE-BURNS, INC. (US) 1996-08-27 US claimed
EP-0423246-A1 PROCESS FOR PRODUCING ALKYL GLYCOSIDE FATTY ACID POLYESTER FAT SUBSTITUTES AND PRODUCTS PRODUCED BY THE PROCESS CURTICE-BURNS, INC. (US) 1991-04-24 EP claimed
WO-1990013556-A1 PROCESS FOR PRODUCING ALKYL GLYCOSIDE FATTY ACID POLYESTER FAT SUBSTITUTES AND PRODUCTS PRODUCED BY THE PROCESS CURTICE-BURNS, INC. (US) 1990-11-15 WO claimed