Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL458322 | 1.00 | TSHR (0.35) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL11184899 | 0.81 | TSHR (0.32) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL7950650 | 0.81 | TSHR (0.32) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL7950651 | 0.81 | TSHR (0.32) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL3475057 | 0.81 | TSHR (0.32) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL7515261 | 0.79 | TSHR (0.31) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL7515263 | 0.79 | TSHR (0.31) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL14676663 | 0.78 | — | — | |
| SCHEMBL3284325 | 0.78 | TSHR (0.33) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL10768836 | 0.77 | TSHR (0.36) | TSHRALDH1A1CYP2D6CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117136054-A | Microbial ergothioneine biosynthesis | 科纳根公司 | 2023-11-28 | — | — | CN | claimed |
| CN-113993989-B | Method for producing ergothioneine | 丹麦科技大学 | 2025-02-25 | — | — | CN | disclosed |
| CN-117136054-A | Microbial ergothioneine biosynthesis | 科纳根公司 | 2023-11-28 | — | — | CN | disclosed |
| CN-116445398-A | WNT composition and purification method | 小利兰斯坦福大学托管委员会 | 2023-07-18 | — | — | CN | disclosed |
| CN-113993989-A | Process for producing ergothioneine | 丹麦科技大学 | 2022-01-28 | — | — | CN | disclosed |
| EP-2331649-B1 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2018-06-13 | — | — | EP | disclosed |
| CN-106661585-A | Microbial ergothioneine biosynthesis | 科纳根公司 | 2017-05-10 | — | — | CN | disclosed |
| CN-1742066-B | The siliceous dielectric method of polishing | CABOT MICROELECTRONICS CORP. (US) | 2015-10-21 | — | — | CN | disclosed |
| US-8597540-B2 | Compositions for polishing silicon-containing substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2013-12-03 | — | — | US | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| WO-2010014180-A2 | METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES | CABOT MICROELECTRONICS CORPORATION (US) | 2010-02-04 | — | — | WO | disclosed |
| US-20100029181-A1 | Methods and compositions for polishing silicon-containing substrates | CMC MATERIALS LLC | 2010-02-04 | — | — | US | disclosed |
| US-20090029633-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2009-01-29 | — | — | US | disclosed |
| US-7442645-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2008-10-28 | — | — | US | disclosed |
| US-20060196848-A1 | Readily deinkable toners | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2006-09-07 | — | — | US | disclosed |
| US-20060144824-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-06 | — | — | US | disclosed |
| US-7071105-B2 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION (US) | 2006-07-04 | — | — | US | disclosed |
| EP-1601735-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | Cabot Microelectronics Corporation (US) | 2005-12-07 | — | — | EP | disclosed |
| WO-2004069947-A1 | METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC | CABOT MICROELECTRONICS CORPORATION (US) | 2004-08-19 | — | — | WO | disclosed |
| US-20040152309-A1 | Method of polishing a silicon-containing dielectric | CABOT MICROELECTRONICS CORPORATION | 2004-08-05 | — | — | US | disclosed |