SCHEMBL2989367

SCHEMBL2989367

[CH]1CC2CC1C1C3CCC(C3)C21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL376062 0.71
SCHEMBL23926911 0.71 MEN1 (0.30)
SCHEMBL209614 0.71 MEN1 (0.30)
SCHEMBL30547194 0.67
SCHEMBL145668 0.67
SCHEMBL30112855 0.64 MEN1 (0.30)
SCHEMBL27383455 0.61
SCHEMBL27368837 0.61
SCHEMBL194359 0.60
SCHEMBL1660496 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023182378-A1 POLYCARBONATE RESIN, POLYCARBONATE RESIN COMPOSITION, OPTICAL COMPONENT, AND PRODUCTION METHOD FOR POLYCARBONATE RESIN 旭化成株式会社 2023-09-28 WO claimed
US-9527957-B2 High glass transition temperature photoimageable polycarbonate polymers with pendent polycyclic functional groups PROMERUS, LLC (US) 2016-12-27 US claimed
US-20150353679-A1 HIGH GLASS TRANSITION TEMPERATURE PHOTOIMAGEABLE POLYCARBONATE POLYMERS WITH PENDENT POLYCYCLIC FUNCTIONAL GROUPS PROMERUS, LLC (US) 2015-12-10 US claimed
WO-2014134373-A1 HIGH GLASS TRANSITION TEMPERATURE PHOTOIMAGEABLE POLYCARBONATE POLYMERS WITH PENDENT POLYCYCLIC FUNCTIONAL GROUPS PROMERUS, LLC (US) 2014-09-04 WO claimed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US claimed
US-20050260525-A1 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-11-24 US claimed
JP-62000039-A None JP disclosed
US-20240175814-A1 METHOD FOR EVALUATING RESIST POLYMER MARUZEN PETROCHEMICAL CO., LTD. (JP) 2024-05-30 US disclosed
US-11970557-B2 Polymer containing photoacid generator LG CHEM, LTD. (KR) 2024-04-30 US disclosed
EP-4318130-A1 EVALUATION METHOD FOR RESIST POLYMER Maruzen Petrochemical Co., Ltd. (JP) 2024-02-07 EP disclosed
WO-2023204165-A1 METHOD FOR PRODUCING POLYMER SOLUTION 丸善石油化学株式会社 2023-10-26 WO disclosed
WO-2023182378-A1 POLYCARBONATE RESIN, POLYCARBONATE RESIN COMPOSITION, OPTICAL COMPONENT, AND PRODUCTION METHOD FOR POLYCARBONATE RESIN 旭化成株式会社 2023-09-28 WO disclosed
US-20230242467-A1 HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER MARUZEN PETROCHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed
EP-2009304-A1 TORQUE LIMITER JTEKT Corporation (JP) 2008-12-31 EP disclosed
EP-2003353-A1 TORQUE LIMITER JTEKT Corporation (JP) 2008-12-17 EP disclosed
US-7232642-B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-06-19 US disclosed
US-20050266351-A1 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2005-12-01 US disclosed
US-20050260525-A1 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-11-24 US disclosed
EP-0161112-B1 NOVEL SUBSTITUTED AROMATIC HYDROCARBONS, PROCESSES FOR PRODUCTION THEREOF, AND USE THEREOF MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-07-25 EP disclosed
JP-S6239-A NOVEL SUBSTITUTED AROMATIC HYDROCARBON, PRODUCTION AND USE THEREOF MITSUI PETROCHEM IND LTD 1987-01-06 JP disclosed