Acetaldehyde

Acetaldehyde

SCHEMBL2990526

CC=O.[SrH2].[Ti]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetaldehyde SCHEMBL1652960 0.94
Acetaldehyde SCHEMBL16604 0.94
Acetaldehyde SCHEMBL3002331 0.88
Acetaldehyde SCHEMBL5556081 0.88
Acetaldehyde SCHEMBL2995243 0.88
Acetaldehyde SCHEMBL28511906 0.88
Acetaldehyde SCHEMBL2999197 0.88
Acetaldehyde SCHEMBL1331732 0.87
Acetaldehyde SCHEMBL3945841 0.87
Acetaldehyde SCHEMBL1330497 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12304830-B2 Porous oxide semiconductor particles KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2025-05-20 US disclosed
US-20230406720-A1 POROUS OXIDE SEMICONDUCTOR PARTICLES KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2023-12-21 US disclosed
US-9214279-B2 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. (JP) 2015-12-15 US disclosed
US-20100183803-A1 ULTRAFINE METAL OXIDE PARTICLE DISPERSION LIQUID AND ULTRAFINE METAL OXIDE PARTICLE THIN FILM MURATA MANUFACTURING CO., LTD. (JP) 2010-07-22 US disclosed
US-20050194573-A1 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. 2005-09-08 US disclosed