Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 2/20 | 0.32 |
| ▸ | CA6 | P23280 | 2/20 | 0.32 |
| ▸ | CA7 | P43166 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.32 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL189943 | 0.85 | — | — | |
| SCHEMBL28189424 | 0.85 | CA12 (0.32) | CA12CA6CA7CA9CA14 | |
| Ammonia Solution, Strong SCHEMBL27937092 | 0.84 | — | — | |
| SCHEMBL37492 | 0.84 | CA12 (0.42) | CA12CA6CA7CA9CA14 | |
| SCHEMBL27831798 | 0.83 | CA12 (0.33) | CA12CA6CA7CA9CA14 | |
| Methyl Alcohol SCHEMBL28509272 | 0.83 | MEN1 (0.30) | MEN1KMT2A | |
| SCHEMBL32678449 | 0.82 | CA12 (0.38) | CA12CA6CA7CA9CA14 | |
| SCHEMBL32678450 | 0.82 | CA12 (0.38) | CA12CA6CA7CA9CA14 | |
| SCHEMBL25227614 | 0.82 | CA12 (0.41) | CA12CA6CA7CA9CA14 | |
| SCHEMBL394426 | 0.82 | CA12 (0.42) | CA12CA6CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115057962-A | Dispersion resin, process for producing the same, and photoresist composition | 深圳市邦得凌半导体材料有限公司 | 2022-09-16 | — | — | CN | claimed |
| CN-116874659-B | Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same | 深圳市安云鑫新材料科技有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-116874659-A | Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same | 深圳市安云鑫新材料科技有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-115079516-A | Nano silver line photoresist, touch structure and display device | 深圳市邦得凌半导体材料有限公司 | 2022-09-20 | — | — | CN | disclosed |
| CN-115057962-A | Dispersion resin, process for producing the same, and photoresist composition | 深圳市邦得凌半导体材料有限公司 | 2022-09-16 | — | — | CN | disclosed |