⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17229550 | 0.67 | — | — | |
| SCHEMBL2991965 | 0.67 | — | — | |
| SCHEMBL514264 | 0.61 | — | — | |
| SCHEMBL6958420 | 0.61 | — | — | |
| SCHEMBL1164221 | 0.59 | — | — | |
| SCHEMBL3895954 | 0.59 | — | — | |
| SCHEMBL4081166 | 0.57 | — | — | |
| SCHEMBL4446381 | 0.57 | — | — | |
| SCHEMBL1263438 | 0.55 | — | — | |
| SCHEMBL25209330 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100174103-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| EP-2123658-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-11-25 | — | — | EP | disclosed |