Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL2491825 | 0.82 | — | — | |
| Acetic Acid SCHEMBL1023401 | 0.82 | — | — | |
| Oxalic Acid SCHEMBL9336232 | 0.78 | — | — | |
| Acetic Acid SCHEMBL8509103 | 0.78 | FFAR3 (0.64) | — | |
| Acetic Acid SCHEMBL177128 | 0.78 | FFAR3 (0.64) | — | |
| Acetic Acid SCHEMBL360904 | 0.78 | — | — | |
| Acetic Acid SCHEMBL8509101 | 0.78 | FFAR3 (0.64) | — | |
| Acetic Acid SCHEMBL6832356 | 0.77 | FFAR3 (0.78) | — | |
| Acetic Acid SCHEMBL5071219 | 0.77 | FFAR3 (0.78) | — | |
| Acetic Acid SCHEMBL9525105 | 0.77 | FFAR3 (0.78) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111752096-B | Photosensitive resin composition for color filter and color filter | 常州正洁智造科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| WO-2022199625-A1 | PHOTOSENSITIVE RESIN COMPOSITION HAVING IMPROVED SYSTEM HUE STABILITY | 常州正洁智造科技有限公司 | 2022-09-29 | — | — | WO | disclosed |