⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11691446 | 0.67 | — | — | |
| SCHEMBL8085659 | 0.61 | — | — | |
| SCHEMBL28909632 | 0.61 | — | — | |
| SCHEMBL443212 | 0.51 | — | — | |
| Sulfuric Acid SCHEMBL20590500 | 0.50 | — | — | |
| SCHEMBL329212 | 0.48 | — | — | |
| Sulfuric Acid SCHEMBL29036454 | 0.47 | — | — | |
| Sulfuric Acid SCHEMBL27592259 | 0.47 | — | — | |
| Sulfuric Acid SCHEMBL28012634 | 0.47 | — | — | |
| Sulfuric Acid SCHEMBL27758086 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3435158-B1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-11460769-B2 | Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2022-10-04 | — | — | US | disclosed |