Formaldehyde

Formaldehyde

SCHEMBL2997149

C=O.[BaH2].[Ti]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL16040 0.89
Formaldehyde SCHEMBL490308 0.89
Formaldehyde SCHEMBL16927202 0.89
Formaldehyde SCHEMBL4759057 0.89
Formaldehyde SCHEMBL2998643 0.80
Formaldehyde SCHEMBL2988882 0.80
Formaldehyde SCHEMBL31427007 0.80
Formaldehyde SCHEMBL8203913 0.80
Formaldehyde SCHEMBL16445235 0.80
Formaldehyde SCHEMBL28722799 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9214279-B2 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. (JP) 2015-12-15 US disclosed
EP-2770510-A1 DIELECTRIC FILM AND TRANSDUCER USING SAME Tokai Rubber Industries, Ltd. (JP) 2014-08-27 EP disclosed
US-20140004364-A1 DIELECTRIC FILM AND TRANSDUCER INCLUDING THE SAME TOKAI RUBBER INDUSTRIES, LTD. (JP) 2014-01-02 US disclosed
US-20100183803-A1 ULTRAFINE METAL OXIDE PARTICLE DISPERSION LIQUID AND ULTRAFINE METAL OXIDE PARTICLE THIN FILM MURATA MANUFACTURING CO., LTD. (JP) 2010-07-22 US disclosed
US-20050194573-A1 Ultrafine metal oxide particle dispersion liquid and ultrafine metal oxide particle thin film MURATA MANUFACTURING CO., LTD. 2005-09-08 US disclosed