⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2258817 | 0.72 | — | — | |
| Bromoform SCHEMBL8874563 | 0.61 | — | — | |
| Bromoform SCHEMBL18691 | 0.61 | — | — | |
| Bromide SCHEMBL4460923 | 0.55 | — | — | |
| Bromoform SCHEMBL29018896 | 0.55 | — | — | |
| Bromoform SCHEMBL30241098 | 0.55 | — | — | |
| SCHEMBL95259 | 0.55 | — | — | |
| SCHEMBL1040196 | 0.50 | — | — | |
| SCHEMBL96926 | 0.50 | — | — | |
| SCHEMBL6745190 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2911002-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-17 | — | — | EP | disclosed |
| EP-3007004-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-20180074404-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| EP-3279731-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-9785048-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9746769-B2 | — | — | 2017-08-29 | — | — | US | disclosed |
| EP-2781504-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-9354516-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160124303-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-05-05 | — | — | US | disclosed |
| EP-3007004-A1 | RESIST COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2016-04-13 | — | — | EP | disclosed |
| EP-2287162-A1 | Derivatives of 4-piperazin-1-yl-4-benzo[b]thiophene suitable for the treatment of cns disorders | Otsuka Pharmaceutical Co., Ltd. (JP) | 2011-02-23 | — | — | EP | disclosed |
| EP-2287161-A1 | Derivatives of 4-piperazin-1-yl-4-benzo[b]thiophene suitable for the treatment of cns disorders | Otsuka Pharmaceutical Co., Limited (JP) | 2011-02-23 | — | — | EP | disclosed |
| EP-2284169-A1 | Derivatives of 4-piperazin-1-yl-4-benzo[b]thiophene suitable for the treatment of CNS disorders | Otsuka Pharmaceutical Co., Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-20110003787-A1 | NOVEL PHENYLPYRROLE DERIVATIVE | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2239253-A1 | NOVEL PHENYLPYRROLE DERIVATIVE | Daiichi Sankyo Company, Limited (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20090264404-A1 | Derivatives of 4-piperazin-1-yl-4-benzo[b]thiophene suitable for the treatment of cns disorders | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| EP-1919907-A2 | HETEROCYCLIC COMPOUND | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2008-05-14 | — | — | EP | disclosed |
| WO-2007026959-A2 | DERIVATIVES OF 4-PIPERAZIN-1-YL-4-BENZ0 [B] THIOPHENE SUITABLE FOR THE TREATMENT OF CNS DISORDERS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2007-03-08 | — | — | WO | disclosed |
| US-6586356-B2 | Coordination catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20010020075-A1 | Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-09-06 | — | — | US | disclosed |