SCHEMBL30003049

SCHEMBL30003049

c1ccc(OCCOc2ccc(OCCOc3ccccc3)c3ccccc23)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNA3 P22001 7/20 0.63
ALDH1A1 P00352 2/20 0.53
TAAR1 Q96RJ0 1/20 0.52
RECQL P46063 1/20 0.52
RAB9A P51151 2/20 0.50
NPC1 O15118 1/20 0.50
TSHR P16473 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
IDO1 P14902 1/20 0.50
MAPT P10636 1/20 0.49
PKM P14618 2/20 0.48
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
HDAC3 O15379 1/20 0.47
HDAC4 P56524 1/20 0.47
HDAC1 Q13547 1/20 0.47
HDAC7 Q8WUI4 1/20 0.47
HDAC2 Q92769 1/20 0.47
HDAC10 Q969S8 1/20 0.47
HDAC11 Q96DB2 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23271967 1.00 KCNA3 (0.63) KCNA3ALDH1A1TAAR1RECQLRAB9A
SCHEMBL12604002 0.90 KCNA3 (0.54) KCNA3ALDH1A1RAB9AL3MBTL1IDO1
SCHEMBL17787242 0.89 IDO1 (0.69) KCNA3ALDH1A1TAAR1RECQLRAB9A
SCHEMBL6362224 0.88 POLB (0.56) KCNA3ALDH1A1TAAR1RAB9AL3MBTL1
SCHEMBL2284857 0.84 KCNA3 (0.89) KCNA3ALDH1A1RAB9AMAPTKMT2A
SCHEMBL9617077 0.83 KCNA3 (0.67) KCNA3ALDH1A1TAAR1RECQLRAB9A
SCHEMBL10865526 0.83 KCNA3 (0.60) KCNA3ALDH1A1TAAR1RECQLRAB9A
SCHEMBL27962 0.83 KCNA3 (0.82) KCNA3ALDH1A1TAAR1RECQLPKM
SCHEMBL30004203 0.82 KCNA3 (0.46) KCNA3ALDH1A1RAB9ANPC1L3MBTL1
SCHEMBL23271958 0.82 KCNA3 (0.46) KCNA3ALDH1A1RAB9ANPC1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 CN disclosed