SCHEMBL30009315

SCHEMBL30009315

COc1ccc([I+]c2ccccc2)cc1.F[P-](F)(F)(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.50
LTA4H P09960 2/20 0.48
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
TRPA1 O75762 1/20 0.44
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
KDM1A O60341 1/20 0.41
HSD11B1 P28845 1/20 0.41
ALDH1A1 P00352 3/20 0.40
EDNRA P25101 1/20 0.40
MAPK1 P28482 1/20 0.39
HTT P42858 1/20 0.39
ACHE P22303 1/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29854099 0.92 CA1 (0.52) CA4LTA4HCA12CA1CA2
SCHEMBL126675 0.92 CA4 (0.59) CA4LTA4HCA12CA1CA2
Bromide SCHEMBL4851524 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
Fluoride Ion SCHEMBL244398 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
Water SCHEMBL8070408 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
Hydrochloric Acid SCHEMBL7696226 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
SCHEMBL4578411 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL10456836 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL29672423 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL757330 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109752923-B Photosensitive resin composition 三星显示有限公司 2025-01-17 CN claimed
CN-109752923-B Photosensitive resin composition 三星显示有限公司 2025-01-17 CN disclosed
CN-116648671-A Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index 株式会社东进世美肯 2023-08-25 CN disclosed
US-20220342309-A1 PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE COMPRISING SAME DONGJIN SEMICHEM CO., LTD. (KR) 2022-10-27 US disclosed
CN-115220303-A Photosensitive resin composition and display device comprising same 株式会社东进世美肯 2022-10-21 CN disclosed