⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18603146 | 1.00 | — | — | |
| SCHEMBL331735 | 0.87 | — | — | |
| SCHEMBL20162287 | 0.82 | — | — | |
| SCHEMBL34398 | 0.82 | — | — | |
| SCHEMBL31694990 | 0.82 | — | — | |
| SCHEMBL11654272 | 0.82 | — | — | |
| SCHEMBL29085 | 0.82 | — | — | |
| SCHEMBL1902881 | 0.82 | — | — | |
| SCHEMBL20598435 | 0.82 | — | — | |
| SCHEMBL3779810 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12482704-B2 | Self-forming barrier for use in air gap formation | ADEIA SEMICONDUCTOR SOLUTIONS LLC (US) | 2025-11-25 | — | — | US | disclosed |
| US-12315807-B2 | Reducing copper line resistance | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2025-05-27 | — | — | US | disclosed |
| US-20240395702-A1 | SEMICONDUCTOR INTERCONNECT STRUCTURE WITH DOUBLE CONDUCTORS | BANK OF AMERICA, N.A., AS COLLATERAL AGENT | 2024-11-28 | — | — | US | disclosed |
| US-12087685-B2 | Semiconductor interconnect structure with double conductors | TESSERA LLC (US) | 2024-09-10 | — | — | US | disclosed |
| US-20230335438-A1 | SELF-FORMING BARRIER FOR USE IN AIR GAP FORMATION | ADEIA SEMICONDUCTOR SOLUTIONS LLC | 2023-10-19 | — | — | US | disclosed |
| US-11587830-B2 | Self-forming barrier for use in air gap formation | TESSERA LLC (US) | 2023-02-21 | — | — | US | disclosed |