⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10407567 | 0.73 | — | — | |
| SCHEMBL11022151 | 0.71 | — | — | |
| SCHEMBL9463586 | 0.71 | — | — | |
| SCHEMBL15785136 | 0.71 | — | — | |
| SCHEMBL16668729 | 0.69 | — | — | |
| SCHEMBL17975848 | 0.69 | — | — | |
| SCHEMBL9065265 | 0.68 | — | — | |
| Trimethylammonium SCHEMBL4265011 | 0.67 | — | — | |
| SCHEMBL35695 | 0.65 | — | — | |
| SCHEMBL2527069 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117779030-B | Silicon crystal tank liquid and environment-friendly metal surface treatment process | 开平和盟环保科技有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-117779030-A | Silicon crystal tank liquid and environment-friendly metal surface treatment process | 开平和盟环保科技有限公司 | 2024-03-29 | — | — | CN | claimed |
| EP-1279072-B1 | OZONE-ENHANCED SILYLATION PROCESS TO INCREASE ETCH RESISTANCE OF ULTRA THIN RESISTS | ADVANCED MICRO DEVICES INC (US) | 2004-10-06 | — | — | EP | claimed |
| US-6746822-B1 | DEPOSITING ON SEMICONDUCTOR SUBSTRATE LIGHT-DEGRADABLE SURFACE COUPLING AGENT WHICH LOSES ADHESION PROPERTIES ON EXPOSURE TO LIGHT, DEPOSITING RESIST, IRRADIATING PORTIONS OF RESIST, AT LEAST PARTIALLY DECOMPOSING COUPLER, DEVELOPING RESIST | ADVANCED MICRO DEVICES, INC. | 2004-06-08 | — | — | US | claimed |
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | claimed |
| US-6645702-B1 | Treat resist surface to prevent pattern collapse | ADVANCED MICRO DEVICES, INC. | 2003-11-11 | — | — | US | claimed |
| EP-1279072-A2 | UV-ENHANCED SILYLATION PROCESS TO INCREASE ETCH RESISTANCE OF ULTRA THIN RESISTS | ADVANCED MICRO DEVICES, INC. (US) | 2003-01-29 | — | — | EP | claimed |
| US-6451512-B1 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | ADVANCED MICRO DEVICES, INC. | 2002-09-17 | — | — | US | claimed |
| WO-2001084599-A2 | UV-ENHANCED SILYLATION PROCESS TO INCREASE ETCH RESISTANCE OF ULTRA THIN RESISTS | ADVANCED MICRO DEVICES, INC. (US) | 2001-11-08 | — | — | WO | claimed |
| US-5707783-A | Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging | COMPLEX FLUID SYSTEMS, INC. (US) | 1998-01-13 | — | — | US | claimed |
| US-4491669-A | Mixed alkoxyaminosilanes, methods of making same and vulcanizing silicons prepared therefrom | PETRARCH SYSTEMS INC. (US) | 1985-01-01 | — | — | US | claimed |
| CN-117779030-B | Silicon crystal tank liquid and environment-friendly metal surface treatment process | 开平和盟环保科技有限公司 | 2024-05-17 | — | — | CN | disclosed |
| CN-117779030-A | Silicon crystal tank liquid and environment-friendly metal surface treatment process | 开平和盟环保科技有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-107400877-B | Ground state hydrogen radical source for chemical vapor deposition of silicon-containing carbon films | 朗姆研究公司 | 2020-06-30 | — | — | CN | disclosed |
| EP-2145929-B1 | Method for manufacturing redispersible, surface-modified silicon dioxide particles | EVONIK OPERATIONS GMBH (DE) | 2020-06-24 | — | — | EP | disclosed |
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | disclosed |
| US-6645702-B1 | Treat resist surface to prevent pattern collapse | ADVANCED MICRO DEVICES, INC. | 2003-11-11 | — | — | US | disclosed |
| US-6451512-B1 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | ADVANCED MICRO DEVICES, INC. | 2002-09-17 | — | — | US | disclosed |
| US-5707783-A | Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging | COMPLEX FLUID SYSTEMS, INC. (US) | 1998-01-13 | — | — | US | disclosed |
| US-4491669-A | Mixed alkoxyaminosilanes, methods of making same and vulcanizing silicons prepared therefrom | PETRARCH SYSTEMS INC. (US) | 1985-01-01 | — | — | US | disclosed |