SCHEMBL303196

SCHEMBL303196

CC[Mg]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16423972 0.81
SCHEMBL8199424 0.73
SCHEMBL43451 0.73
SCHEMBL15511352 0.70
SCHEMBL183404 0.70
SCHEMBL646233 0.69
SCHEMBL2589312 0.69
Carbon Monoxide SCHEMBL10884406 0.65
SCHEMBL5034113 0.65
SCHEMBL16424121 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112420477-B High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2022-09-06 CN claimed
CN-112420477-A High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2021-02-26 CN claimed
CN-110783281-B Film packaging assembly of stretchable electronic device and preparation method thereof 华中科技大学 2021-02-05 CN claimed
CN-110783281-A Film packaging assembly of stretchable electronic device and preparation method thereof 华中科技大学 2020-02-11 CN claimed
EP-4315395-A1 ENCAPSULATION LAYER FOR CHALCOGENIDE MATERIAL Eugenus, Inc. (US) 2024-02-07 EP disclosed
US-11631785-B2 Group-III nitride laminated substrate and semiconductor light-emitting element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-04-18 US disclosed
CN-112420477-B High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2022-09-06 CN disclosed
CN-112420477-B High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2022-09-06 CN disclosed
US-20210217927-A1 GROUP-III NITRIDE LAMINATED SUBSTRATE AND SEMICONDUCTOR LIGHT-EMITTING ELEMENT SCIOCS COMPANY LIMITED (JP) 2021-07-15 US disclosed
CN-112838149-A Group III nitride laminate substrate and semiconductor light-emitting element 赛奥科思有限公司 2021-05-25 CN disclosed
CN-112420477-A High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2021-02-26 CN disclosed
CN-112420477-A High-gain and low-luminescence ALD-MCP and preparation method and application thereof 北方夜视技术股份有限公司 2021-02-26 CN disclosed
US-6411636-B1 Nitride semiconductor laser and method of fabricating the same PIONEER CORPORATION (JP) 2002-06-25 US disclosed
US-6335218-B1 Method for fabricating a group III nitride semiconductor device PIONEER CORPORATION (JP) 2002-01-01 US disclosed
US-20010055324-A1 Nitride semiconductor laser and method of manufacturing the same PIONEER CORPORATION (JP) 2001-12-27 US disclosed
US-6329667-B1 Nitride semiconductor light emitting device and manufacturing method thereof PIONEER CORPORATION (JP) 2001-12-11 US disclosed
US-6235548-B1 HEAT TREATMENT; SUPPLYING HYDROCARBON GAS PIONEER CORPORATION (JP) 2001-05-22 US disclosed
US-6207469-B1 Method for manufacturing a semiconductor device PIONEER ELECTRONIC CORPORATION (JP) 2001-03-27 US disclosed
EP-1052705-A1 Method for fabricating a group III Nitride semiconductor device Pioneer Corporation (JP) 2000-11-15 EP disclosed
EP-1014520-A1 Nitride semiconductor laser and method of fabricating the same Pioneer Corporation (JP) 2000-06-28 EP disclosed