SCHEMBL3033756

SCHEMBL3033756

CCCCC(CC)COC(=O)CC(=O)O

nearest known ligand 0.70

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 6/20 0.70
TSHR P16473 4/20 0.70
TDP1 Q9NUW8 2/20 0.70
ATM Q13315 1/20 0.70
RECQL P46063 1/20 0.57
ALDH1A1 P00352 7/20 0.53
CA2 P00918 4/20 0.53
LMNA P02545 3/20 0.48
L3MBTL1 Q9Y468 1/20 0.47
MAPK1 P28482 3/20 0.47
HSD17B10 Q99714 1/20 0.47
PRSS1 P07477 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
MMP9 P14780 1/20 0.44
MMP8 P22894 1/20 0.44
MMP14 P50281 1/20 0.44
CA1 P00915 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2215691 0.91 CYP3A4 (0.77) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL25185267 0.88 TSHR (0.53) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL27868185 0.86 CYP3A4 (0.70) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL650083 0.86 CYP3A4 (0.70) CYP3A4TSHRTDP1ATMRECQL
Propionic Acid SCHEMBL28575585 0.86 CYP3A4 (0.70) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL29292314 0.86 CYP3A4 (0.51) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL6515851 0.85 CYP3A4 (0.56) CYP3A4TSHRTDP1ATMRECQL
Propionic Acid SCHEMBL29203862 0.85 CYP3A4 (0.68) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL156834 0.85 CYP3A4 (0.78) CYP3A4TSHRTDP1ATMRECQL
SCHEMBL11655901 0.85 CYP3A4 (0.68) CYP3A4TSHRTDP1ATMRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5902896-A Process for preparing bis (hydroxymethyl) compounds HUELS AKTIENGESELLSCHAFT (DE) 1999-05-11 US claimed
JP-9087234-A None JP disclosed
US-20240417602-A1 ELECTROCONDUCTIVE COMPOSITION TOYOBO CO., LTD. (JP) 2024-12-19 US disclosed
US-20240417606-A1 ELECTROCONDUCTIVE CURED PRODUCT TOYOBO CO., LTD. (JP) 2024-12-19 US disclosed
US-20240409791-A1 ELECTROCONDUCTIVE COMPOSITION TOYOBO CO., LTD. (JP) 2024-12-12 US disclosed
EP-4421125-A1 ELECTROCONDUCTIVE COMPOSITION Toyobo Co., Ltd. (JP) 2024-08-28 EP disclosed
EP-4421124-A1 ELECTROCONDUCTIVE COMPOSITION Toyobo Co., Ltd. (JP) 2024-08-28 EP disclosed
EP-4422364-A1 ELECTROCONDUCTIVE CURED PRODUCT Toyobo Co., Ltd. (JP) 2024-08-28 EP disclosed
CN-118202001-A Conductive composition 东洋纺株式会社 2024-06-14 CN disclosed
CN-118139929-A Conductive composition 东洋纺株式会社 2024-06-04 CN disclosed
JP-H0987234-A ULTRAVIOLET LIGHT ABSORBER FOR SKIN AND HAIR, AND SKIN PREPARATION FOR EXTERNAL USE AND HAIR COSMETIC CONTAINING THE SAME KAO CORP 1997-03-31 JP disclosed
EP-0686670-A1 Organosiloxane compositions curable into elastomers under elimination of alcohols Wacker-Chemie GmbH (DE) 1995-12-13 EP disclosed
EP-0475751-B1 Working fluid composition for refrigerating machine KAO CORP (JP) 1995-12-06 EP disclosed
US-5202044-A Mixture of fluorohydrocarbon, epoxycyclo(pentane or hexane), and ester KAO CORPORATION (JP) 1993-04-13 US disclosed
EP-0501440-A1 Composition for refrigerator working fluid use KAO CORPORATION (JP) 1992-09-02 EP disclosed
EP-0475751-A1 Working fluid composition for refrigerating machine Kao Corporation (JP) 1992-03-18 EP disclosed
US-4726942-A SUNSCREEN AGENTS L'OREAL (FR) 1988-02-23 US disclosed
US-4663088-A COSMETIC SUNSCREENS L'OREAL (FR) 1987-05-05 US disclosed
US-4654434-A SUN FILTERS L'OREAL (FR) 1987-03-31 US disclosed
US-4585597-A 3-benzylidene-camphors, process for their preparation and their use in protection against UV rays L'OREAL (FR) 1986-04-29 US disclosed