Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | F2 | P00734 | 3/20 | 0.46 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.46 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.46 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.46 |
| ▸ | HTR6 | P50406 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | DUSP5 | Q16690 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.39 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.38 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.38 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.38 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12095551 | 0.87 | CA1 (0.45) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL38662875 | 0.87 | F2 (0.45) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL6757949 | 0.85 | CA1 (0.41) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL4889621 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL5684924 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL4886341 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL1948673 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| SCHEMBL4888590 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| Potassium Ion SCHEMBL10962719 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 | |
| Zinc Ion SCHEMBL1683962 | 0.85 | CA1 (0.61) | CA1CA2CA9F2PRSS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 459 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140335448-A1 | PHOTOSENSITIVE SILOXANE RESIN COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-11-13 | — | — | US | claimed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | claimed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | claimed |
| US-RE37179-E1 | ADDITION POLYMER | JSR CORPORATION (JP) | 2001-05-15 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| CN-120077771-A | Curable composition for organic EL element, cured product for organic EL element, method for producing cured product for organic EL element, and polymer | JSR株式会社 | 2025-05-30 | — | — | CN | disclosed |
| WO-2025062940-A1 | RESIN COMPOSITION, SUBSTRATE WITH PIEZOELECTRIC FILM, AND METHOD FOR PRODUCING SUBSTRATE WITH PIEZOELECTRIC FILM | 東レ株式会社 | 2025-03-27 | — | — | WO | disclosed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-20240168383-A1 | STRUCTURE FOR OPTICAL DEVICES, PROCESS FOR PREPARING THE SAME, AND PHOTOCURABLE SILOXANE RESIN COMPOSITION THEREFOR | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2024-05-23 | — | — | US | disclosed |
| CN-114690562-A | Structure for optical device, method for preparing the same, and photocurable silicone resin composition for the same | 罗门哈斯电子材料韩国有限公司 | 2022-07-01 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |