SCHEMBL30366175

SCHEMBL30366175

Brc1ccc2c(Br)cccc2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 2/20 0.52
SLC9A1 P19634 1/20 0.46
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
RXFP1 Q9HBX9 1/20 0.42
BACE1 P56817 1/20 0.41
ERN1 O75460 1/20 0.40
DAO P14920 1/20 0.40
ALDH1A1 P00352 3/20 0.38
KDM4E B2RXH2 1/20 0.38
MAPT P10636 1/20 0.38
CYP1A2 P05177 3/20 0.38
CYP2C19 P33261 1/20 0.38
HTT P42858 1/20 0.38
PLAU P00749 1/20 0.37
MAPK1 P28482 2/20 0.36
ALOX15 P16050 1/20 0.36
AHR P35869 3/20 0.35
NR4A2 P43354 1/20 0.35
SIRT2 Q8IXJ6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1461517 1.00 CYP2A6 (0.52) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL29656897 1.00 CYP2A6 (0.52) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL29010725 0.90 CYP2A6 (0.48) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL27893506 0.83 CYP2A6 (0.56) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL29702987 0.83 CYP2A6 (0.56) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL29703049 0.83 CYP2A6 (0.56) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL28886901 0.83 CYP2A6 (0.56) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL30639475 0.83 CYP2A6 (0.56) CYP2A6SLC9A1MEN1KMT2ARXFP1
SCHEMBL6562541 0.81 CYP2A6 (0.52) CYP2A6MEN1KMT2ARXFP1BACE1
SCHEMBL30366448 0.81 CYP2A6 (0.52) CYP2A6MEN1KMT2ARXFP1BACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN disclosed
CN-115991815-A Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2023-04-21 CN disclosed