SCHEMBL30471

SCHEMBL30471

FC(=C(F)C(F)F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30470 1.00
SCHEMBL2466745 1.00
SCHEMBL32910 0.80
SCHEMBL31471512 0.80
SCHEMBL27999220 0.77
Methane SCHEMBL28056031 0.77
Fluoride SCHEMBL28178425 0.77
SCHEMBL28251395 0.77
SCHEMBL4423360 0.75
SCHEMBL4423357 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 679 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250320397-A1 NON-PFAS REFRIGERANTS AND METHODS OF COOLING ELECTRONICS SOLSTICE ADVANCED MATERIALS US, INC. 2025-10-16 US claimed
US-12410368-B2 Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition SEMES CO., LTD. (KR) 2025-09-09 US claimed
US-20240392191-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
US-20240392192-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
US-11851602-B2 Epoxide and fluorinated epoxide stabilizers for fluoroolefins THE CHEMOURS COMPANY FC, LLC (US) 2023-12-26 US claimed
US-20230407179-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO., LTD. (KR) 2023-12-21 US claimed
US-20230407175-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO LTD (KR) 2023-12-21 US claimed
US-20230407177-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO., LTD. (KR) 2023-12-21 US claimed
US-20230313039-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE SAME SEMES CO., LTD. (KR) 2023-10-05 US claimed
EP-3461872-B1 REFRIGERANT ADDITIVE COMPOSITIONS CONTAINING PERFLUOROPOLYETHERS CHEMOURS CO FC LLC (US) 2022-11-09 EP claimed
CN-1738836-A Polymerization process EXXONMOBIL CHEM PATENTS INC (US) 2006-02-22 CN claimed
CN-1738843-A Polymers with novel sequence distributions EXXONMOBIL CHEM PATENTS INC (US) 2006-02-22 CN claimed
CN-1729209-A Polymerization processes EXXONMOBIL CHEM PATENTS INC (US) 2006-02-01 CN claimed
CN-1729208-A Polymerization processes EXXONMOBIL CHEM PATENTS INC (US) 2006-02-01 CN claimed
CN-1729215-A Polymers with new sequence distributions EXXONMOBIL CHEM PATENTS INC (US) 2006-02-01 CN claimed
WO-2006009550-A1 METHODS FOR SEPARARING SLURRY COMPONENTS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2006-01-26 WO claimed
EP-1572766-A1 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS ExxonMobil Chemical Patents Inc. (US) 2005-09-14 EP claimed
US-20050107536-A1 Polymers with new sequence distributions EXXONMOBIL CHEMICAL PATENTS INC. 2005-05-19 US claimed
US-20050101751-A1 Halogenated polymers with new sequence distributions EXXONMOBIL CHEMICAL PATENTS INC. 2005-05-12 US claimed
WO-2004058836-A1 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-07-15 WO claimed