Dimethyl Sulfoxide

Dimethyl Sulfoxide

SCHEMBL3047831

CCC(=O)CC.C[S+](C)[O-]

nearest known ligand 0.67

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Known targets — ChEMBL curated mechanism

MAP2K1MAP2K2

The experimentally established mechanism targets of Dimethyl Sulfoxide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.67
FFAR3 O14843 3/20 0.39
ALDH1A1 P00352 3/20 0.39
CES2 O00748 3/20 0.35
CES1 P23141 3/20 0.35
HDAC3 O15379 2/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC8 Q9BY41 2/20 0.32
SOAT1 P35610 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butane SCHEMBL7927043 0.82 TDP1 (0.83) TDP1FFAR3ALDH1A1CES2CES1
SCHEMBL42679 0.82
SCHEMBL2357325 0.82 TDP1 (1.00) TDP1FFAR3ALDH1A1CES2CES1
SCHEMBL1887087 0.82
Propionic Acid SCHEMBL28846408 0.80
Butanone SCHEMBL2241141 0.80
Propionic Acid SCHEMBL10493407 0.80 FFAR3 (0.67) TDP1FFAR3ALDH1A1CES2CES1
SCHEMBL8617909 0.79
Fluoride SCHEMBL8001538 0.78 TDP1 (0.91) TDP1FFAR3ALDH1A1CES2CES1
SCHEMBL7627319 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106047828-B Carbonyl reductase ChKRED20 mutant and application thereof 中国科学院成都生物研究所 2019-10-08 CN disclosed
US-7807341-B2 Method for forming organic mask and method for forming pattern using said organic mask NEC LCD TECHNOLOGIES, LTD. (JP) 2010-10-05 US disclosed
US-20050230348-A1 Method for forming organic mask and method for forming pattern using said organic mask NEC LCD TECHNOLOGIES, LTD. (JP) 2005-10-20 US disclosed