SCHEMBL30486192

SCHEMBL30486192

O=C1c2ccccc2C(=O)N1c1nccs1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.73
AKR1C3 P42330 1/20 0.61
MAPT P10636 3/20 0.57
POLB P06746 3/20 0.57
HTT P42858 2/20 0.57
LMNA P02545 2/20 0.57
NPSR1 Q6W5P4 2/20 0.57
ALDH1A1 P00352 4/20 0.49
KDM4E B2RXH2 2/20 0.49
MEN1 O00255 2/20 0.49
KMT2A Q03164 2/20 0.49
USP2 O75604 1/20 0.49
AR P10275 4/20 0.49
TDP1 Q9NUW8 3/20 0.49
GAA P10253 2/20 0.47
G6PD P11413 1/20 0.47
PKM P14618 1/20 0.47
MPI P34949 1/20 0.47
EP300 Q09472 1/20 0.47
KAT2A Q92830 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29204149 1.00 HSD17B10 (0.73) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL21477307 0.85 HSD17B10 (0.73) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL11862754 0.85 HSD17B10 (0.64) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL29179695 0.85 HSD17B10 (1.00) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL28199867 0.82 HSD17B10 (0.56) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL21477302 0.80 HSD17B10 (0.66) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL17946147 0.78 AKR1C3 (0.82) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL212821 0.77 HSD17B10 (0.48) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL17047668 0.77 HSD17B10 (0.54) HSD17B10AKR1C3MAPTPOLBHTT
SCHEMBL17696374 0.75 HSD17B10 (0.53) HSD17B10AKR1C3MAPTPOLBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113929906-B Self-crosslinkable isocyanurate polymer and anti-reflection coating composition, preparation method thereof and pattern forming method 厦门恒坤新材料科技股份有限公司 2023-07-04 CN claimed
CN-116478328-B Silicon-containing polymer and bottom anti-reflection coating composition and preparation method thereof 厦门恒坤新材料科技股份有限公司 2025-01-24 CN disclosed