Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.36 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | LTA4H | P09960 | 3/20 | 0.35 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8806890 | 0.77 | CA4 (0.41) | CA4CA12CA1CA2CA7 | |
| SCHEMBL365674 | 0.77 | CA4 (0.41) | CA4CA12CA1CA2CA7 | |
| SCHEMBL29233841 | 0.75 | TSHR (0.37) | CA4CA12CA1CA2CA7 | |
| SCHEMBL1127973 | 0.75 | TSHR (0.37) | CA4CA12CA1CA2CA7 | |
| SCHEMBL4451857 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL29051167 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL9858177 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL29051175 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL29003944 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 | |
| SCHEMBL4454269 | 0.74 | CA4 (0.39) | CA4CA12CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3894512-B1 | COMPOSITION AND METHOD FOR SELECTIVELY ETCHING RUTHENIUM AND/OR COPPER | ENTEGRIS INC (US) | 2025-12-24 | — | — | EP | claimed |
| EP-4429802-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | Entegris, Inc. (US) | 2024-09-18 | — | — | EP | claimed |
| EP-4419619-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | Entegris, Inc. (US) | 2024-08-28 | — | — | EP | claimed |
| US-11845917-B2 | Compositions and methods for post-CMP cleaning of cobalt substrates | ENTEGRIS, INC. (US) | 2023-12-19 | — | — | US | claimed |
| WO-2023086276-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | ENTEGRIS, INC. (US) | 2023-05-19 | — | — | WO | claimed |
| US-20230149916-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | ENTEGRIS, INC. | 2023-05-18 | — | — | US | claimed |
| WO-2023069409-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. (US) | 2023-04-27 | — | — | WO | claimed |
| US-20230121639-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. | 2023-04-20 | — | — | US | claimed |
| EP-4136273-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | Entegris, Inc. (US) | 2023-02-22 | — | — | EP | claimed |
| US-20230030323-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2023-02-02 | — | — | US | claimed |
| US-10351809-B2 | Post chemical mechanical polishing formulations and method of use | ENTEGRIS, INC. (US) | 2019-07-16 | — | — | US | claimed |
| US-20190177671-A1 | TUNGSTEN POST-CMP CLEANING COMPOSITION | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2019-06-13 | — | — | US | claimed |
| WO-2018191424-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ENTEGRIS, INC. (US) | 2018-10-18 | — | — | WO | claimed |
| US-20180291309-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2018-10-11 | — | — | US | claimed |
| US-20180037852-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2018-02-08 | — | — | US | claimed |
| EP-3243213-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | Entegris, Inc. (US) | 2017-11-15 | — | — | EP | claimed |
| WO-2017156304-A1 | TUNGSTEN POST-CMP CLEANING COMPOSITIONS | ENTEGRIS, INC. (US) | 2017-09-14 | — | — | WO | claimed |
| EP-3099839-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | Entegris, Inc. (US) | 2016-12-07 | — | — | EP | claimed |
| US-20160340620-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ADVANCED TECH MATERIALS (US) | 2016-11-24 | — | — | US | claimed |
| WO-2015116818-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-06 | — | — | WO | claimed |