SCHEMBL3055552

SCHEMBL3055552

[Ba+2].[Mg+2].[S-2].[S-2]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ATP4AATP4BGABBR1GABBR2HMGCR

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5961159 0.87
SCHEMBL28832 0.82
SCHEMBL4183786 0.82
SCHEMBL4178645 0.82
SCHEMBL51832 0.82
SCHEMBL3818008 0.82
SCHEMBL5161829 0.82
SCHEMBL8947068 0.67
SCHEMBL7692235 0.67
SCHEMBL8913065 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100473753-C Sputter deposition process for electroluminescent phosphors IFIRE TECHNOLOGY INC (CA) 2009-04-01 CN claimed
EP-1458901-B1 SPUTTER DEPOSITION PROCESS FOR ELECTROLUMINESCENT PHOSPHORS IFIRE TECHNOLOGY CORP (CA) 2005-10-26 EP claimed
CN-1656242-A Sputter deposition process for electroluminescent phosphors IFIRE TECHNOLOGY INC (CA) 2005-08-17 CN claimed
EP-1458901-A2 SPUTTER DEPOSITION PROCESS FOR ELECTROLUMINESCENT PHOSPHORS iFire Technology Inc. (CA) 2004-09-22 EP claimed
US-6793782-B2 Sputter deposition process for electroluminescent phosphors IFIRE TECHNOLOGY INC. (CA) 2004-09-21 US claimed
WO-2003056056-A2 SPUTTER DEPOSITION PROCESS FOR ELECTROLUMINESCENT PHOSPHORS IFIRE TECHNOLOGY INC. (CA) 2003-07-10 WO claimed
US-20030118864-A1 Sputter deposition process for electroluminescent phosphors IFIRE IP CORPORATION (CA) 2003-06-26 US claimed
CN-1993447-B Barium thioaluminate phosphors with novel crystal structures IFIRE TECHNOLOGY CORP 2011-05-04 CN disclosed
US-7811678-B2 Low process temperature thin film phosphor for electroluminescent displays IFIRE IP CORPORATION (CA) 2010-10-12 US disclosed
US-7582228-B2 Barium thioaluminate phosphor materials with novel crystal structures IFIRE IP CORPORATION (CA) 2009-09-01 US disclosed
US-20080296533-A1 BARIUM THIOALUMINATE PHOSPHOR MATERIALS WITH NOVEL CRYSTAL STRUCTURES IFIRE TECHNOLOGY CORP. 2008-12-04 US disclosed
EP-1554913-B1 THIN FILM PHOSPHOR FOR ELECTROLUMINESCENT DISPLAYS IFIRE IP CORP (CA) 2008-11-05 EP disclosed
US-7427367-B2 Barium thioaluminate phosphor materials with novel crystal structures IFIRE TECHNOLOGY CORP. (CA) 2008-09-23 US disclosed
EP-1789513-A1 BARIUM THIOALUMINATE PHOSPHOR MATERIALS WITH NOVEL CRYSTAL STRUCTURES iFire Technology Corp. (CA) 2007-05-30 EP disclosed
US-20060027788-A1 Barium thioaluminate phosphor materials with novel crystal structures IFIRE IP CORPORATION (CA) 2006-02-09 US disclosed
WO-2006012748-A1 BARIUM THIOALUMINATE PHOSPHOR MATERIALS WITH NOVEL CRYSTAL STRUCTURES IFIRE TECHNOLOGY CORP. (CA) 2006-02-09 WO disclosed
US-20050249971-A1 Low process temperature thin film phosphor for electroluminescent displays IFIRE IP CORPORATION (CA) 2005-11-10 US disclosed
EP-1554913-A1 THIN FILM PHOSPHOR FOR ELECTROLUMINESCENT DISPLAYS iFire Technology Corp. (CA) 2005-07-20 EP disclosed
WO-2004026000-A1 THIN FILM PHOSPHOR FOR ELECTROLUMINESCENT DISPLAYS IFIRE TECHNOLOGY CORP. (CA) 2004-03-25 WO disclosed
US-4263377-A CHALCOGENIDE CONDUCTOR, HIGHER DENSITY NONCONDUCTOR DURACELL INTERNATIONAL INC. (US) 1981-04-21 US disclosed