Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionitrile SCHEMBL8759293 | 0.84 | — | — | |
| Morpholine SCHEMBL546382 | 0.81 | — | — | |
| Morpholine SCHEMBL456806 | 0.81 | — | — | |
| Morpholine SCHEMBL7100628 | 0.79 | MEN1 (0.58) | MEN1KMT2AKDM4EGAACYP2C9 | |
| Morpholine SCHEMBL27799126 | 0.78 | MEN1 (0.65) | MEN1KMT2AKDM4EGAACYP2C9 | |
| Morpholine SCHEMBL27685879 | 0.78 | MEN1 (0.65) | MEN1KMT2AKDM4EGAACYP2C9 | |
| Morpholine SCHEMBL11338140 | 0.78 | MEN1 (0.65) | MEN1KMT2AKDM4EGAACYP2C9 | |
| Morpholine SCHEMBL199473 | 0.78 | MEN1 (0.85) | MEN1KMT2AKDM4EGAACYP2C9 | |
| Morpholine SCHEMBL3277059 | 0.78 | — | — | |
| Morpholine SCHEMBL12986700 | 0.77 | MEN1 (0.55) | MEN1KMT2AKDM4EGAACYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808975-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100310991-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-7803511-B2 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJIFILM CORPORATION (JP) | 2010-09-28 | — | — | US | disclosed |
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |