⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4346875 | 0.76 | — | — | |
| SCHEMBL19927439 | 0.75 | — | — | |
| SCHEMBL3082169 | 0.75 | — | — | |
| SCHEMBL19926671 | 0.71 | — | — | |
| SCHEMBL3745528 | 0.71 | — | — | |
| SCHEMBL3069981 | 0.71 | — | — | |
| SCHEMBL19927460 | 0.67 | — | — | |
| SCHEMBL21112547 | 0.67 | — | — | |
| SCHEMBL21112854 | 0.67 | — | — | |
| SCHEMBL19927001 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| CN-110498908-B | Polyfluorene derivative containing siloxane side chain suitable for ink-jet printing process and preparation method and application thereof | 东莞伏安光电科技有限公司 | 2021-10-08 | — | — | CN | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| US-20200035494-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-01-30 | — | — | US | claimed |
| US-20190211210-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-07-11 | — | — | US | claimed |
| US-8742003-B2 | Silylated amino resins | BASF SE (DE) | 2014-06-03 | — | — | US | claimed |
| EP-2675830-A1 | SILYLATED AMINO RESINS | BASF SE (DE) | 2013-12-25 | — | — | EP | claimed |
| US-20130035435-A1 | SILYLATED AMINO RESINS | BASF SE (DE) | 2013-02-07 | — | — | US | claimed |
| WO-2012110926-A1 | SILYLATED AMINO RESINS | BASF SE (DE) | 2012-08-23 | — | — | WO | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| WO-2025096565-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-08 | — | — | WO | disclosed |
| US-20070253925-A1 | Silicon-based tocopherol derivatives | GELEST TECHNOLOGIES, INC. (US) | 2007-11-01 | — | — | US | disclosed |
| US-7211543-B2 | Photocatalyst composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2007-05-01 | — | — | US | disclosed |
| US-20050227859-A1 | Photocatalyst composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2005-10-13 | — | — | US | disclosed |
| EP-1518601-A1 | PHOTOCATALYST COMPOSITION | Asahi Kasei Kabushiki Kaisha (JP) | 2005-03-30 | — | — | EP | disclosed |